发明授权
- 专利标题: Self-aligned pole trim process
- 专利标题(中): 自对准极修整过程
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申请号: US10284848申请日: 2002-10-31
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公开(公告)号: US06887355B2公开(公告)日: 2005-05-03
- 发明人: Cherng-Chyi Han , Mao-Min Chen , Fenglin Liu
- 申请人: Cherng-Chyi Han , Mao-Min Chen , Fenglin Liu
- 申请人地址: US CA Milpitas
- 专利权人: Headway Technologies, Inc.
- 当前专利权人: Headway Technologies, Inc.
- 当前专利权人地址: US CA Milpitas
- 代理商 George O. Saile; Stephen B. Ackerman
- 主分类号: G11B5/31
- IPC分类号: G11B5/31 ; C23C14/34 ; B05D1/40 ; B05D3/00
摘要:
A method for forming a trimmed upper pole piece for a magnetic write head, said pole piece having a uniform width above and below a write gap layer. Prior art methods of trimming pole pieces to a final width using ion-beam etches produce pole pieces with thickness differentials due to the etch resistant nature of the alumina write-gap filling material. The present method uses NiCr, NiFeCr or Ru as write gap filling materials which have an etch rate which is substantially equal to the etch rate of the other layers forming the pole piece and are highly corrosion resistant.
公开/授权文献
- US20040085674A1 Self-aligned pole trim process 公开/授权日:2004-05-06
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