发明授权
- 专利标题: Method of inspecting a semiconductor device and an apparatus thereof
- 专利标题(中): 检查半导体器件的方法及其装置
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申请号: US09791682申请日: 2001-02-26
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公开(公告)号: US06888959B2公开(公告)日: 2005-05-03
- 发明人: Akira Hamamatsu , Minori Noguchi , Yoshimasa Ohshima , Hidetoshi Nishiyama , Kenji Oka , Takanori Ninomiya , Maki Tanaka , Kenji Watanabe , Tetsuya Watanabe , Yoshio Morishige
- 申请人: Akira Hamamatsu , Minori Noguchi , Yoshimasa Ohshima , Hidetoshi Nishiyama , Kenji Oka , Takanori Ninomiya , Maki Tanaka , Kenji Watanabe , Tetsuya Watanabe , Yoshio Morishige
- 申请人地址: JP Tokyo JP Tokyo
- 专利权人: Hitachi, Ltd.,Hitachi High-Tech Electronics Engineering Co., Ltd.
- 当前专利权人: Hitachi, Ltd.,Hitachi High-Tech Electronics Engineering Co., Ltd.
- 当前专利权人地址: JP Tokyo JP Tokyo
- 代理机构: Antonelli, Terry, Stout & Kraus, LLP
- 优先权: JP2000-061836 20000302
- 主分类号: G01N21/956
- IPC分类号: G01N21/956 ; G06T7/00 ; H01L21/66 ; G06K9/00
摘要:
In order to inspect a substance to be detected such as a foreign substance in accordance with the condition of the surface of a sample to be inspected such as a semiconductor substrate manufactured in various manufacturing processes under a suitable inspection condition, this method includes the steps of: inspecting a substance to be detected on a sample to be inspected under a plurality inspection conditions, which are previously set, as a single unit to detect at least the data of a detected substance for each of the plurality of inspection conditions; checking the data of the detected substance for the respective inspection conditions against each other to make check data; analyzing the detected substance based on the check data of the detected substance to classify the detected substance; adding the data of classified detected substance to the coordinate data of the detected substance for the respective inspection conditions to make data relating to the classified detected substance for the respective inspection conditions; and selecting a suitable inspection condition based on the data relating to the classified detected substance for the respective inspection conditions.
公开/授权文献
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