发明授权
- 专利标题: Sample inspection system
- 专利标题(中): 样品检验系统
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申请号: US10070079申请日: 1998-09-18
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公开(公告)号: US06891611B1公开(公告)日: 2005-05-10
- 发明人: Mehdi Vaez-Iravani , Stanley Stokowski , Guoheng Zhao
- 申请人: Mehdi Vaez-Iravani , Stanley Stokowski , Guoheng Zhao
- 申请人地址: US CA San Jose
- 专利权人: KLA- Tencor Corporation
- 当前专利权人: KLA- Tencor Corporation
- 当前专利权人地址: US CA San Jose
- 代理机构: Parsons Hsue & de Runtz LLP
- 国际申请: PCTUS98/19564 WO 19980918
- 国际公布: WO9914575 WO 19990325
- 主分类号: G01N21/956
- IPC分类号: G01N21/956 ; G01J3/44 ; G01N21/00 ; G01N21/21 ; G01N21/47 ; G01N21/88 ; G01N21/94 ; G01N21/95 ; H01L21/66
摘要:
A curved mirrored surface (78) is used to collect radiation scattered by a sample surface (76a) and originating from a normal illumination beam (70) and an oblique illumination beam (90). The collected radiation is focused to a detector (80). Scattered radiation originating from the normal and oblique illumination beams may be distinguished by employing radiation at two different wavelengths, by intentionally introducing an offset between the spots illuminated by the two beams or by switching the normal and oblique illumination beams (70, 90) on and off alternately. Beam position error caused by change in sample height may be corrected by detecting specular reflection of an oblique illumination beam and changing the direction of illumination in response thereto. Butterfly-shaped spatial filters may be used in conjunction with curved mirror radiation collectors (78) to restrict detection to certain azimuthal angles.
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