发明授权
- 专利标题: Method and apparatus for electro-chemical processing
- 专利标题(中): 电化学处理方法和装置
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申请号: US09739139申请日: 2000-12-18
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公开(公告)号: US06896776B2公开(公告)日: 2005-05-24
- 发明人: Wei-Yung Hsu , Liang-Yuh Chen , Ratson Morad , Daniel A. Carl , Sasson Somekh
- 申请人: Wei-Yung Hsu , Liang-Yuh Chen , Ratson Morad , Daniel A. Carl , Sasson Somekh
- 申请人地址: US CA Santa Clara
- 专利权人: Applied Materials Inc.
- 当前专利权人: Applied Materials Inc.
- 当前专利权人地址: US CA Santa Clara
- 代理机构: Moser, Patterson & Sheridan
- 主分类号: B24B37/00
- IPC分类号: B24B37/00 ; B24B37/04 ; C25D5/00 ; C25D5/22 ; C25D7/12 ; H01L21/288 ; H01L21/304 ; H01L21/321 ; H01L21/768 ; C25D1/00 ; C25D17/00
摘要:
A method and apparatus is provided for depositing and planarizing a material layer on a substrate. In one embodiment, an apparatus is provided which includes a partial enclosure, a permeable disc, a diffuser plate and optionally an anode. A substrate carrier is positionable above the partial enclosure and is adapted to move a substrate into and out of contact or close proximity with the permeable disc. The partial enclosure and the substrate carrier are rotatable to provide relative motion between a substrate and the permeable disc. In another aspect, a method is provided in which a substrate is positioned in a partial enclosure having an electrolyte therein at a fist distance from a permeable disc. A current is optionally applied to the surface of the substrate and a first thickness is deposited on the substrate. Next, the substrate is positioned closer to the permeable disc and a second thickness is deposited on the substrate. During the deposition, the partial enclosure and the substrate are rotated relative one another.
公开/授权文献
- US20040003894A1 METHOD AND APPARATUS FOR ELECTRO-CHEMICAL PROCESSING 公开/授权日:2004-01-08
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