发明授权
- 专利标题： Resist composition
- 专利标题（中）： 抗蚀组成
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申请号： US10654942申请日： 2003-09-05
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公开(公告)号： US06902862B2公开(公告)日： 2005-06-07
- 发明人: Hyou Takahashi , Kazuyoshi Mizutani , Shoichiro Yasunami
- 申请人： Hyou Takahashi , Kazuyoshi Mizutani , Shoichiro Yasunami
- 申请人地址： JP Kanagawa
- 专利权人： Fuji Photo Film Co., Ltd.
- 当前专利权人： Fuji Photo Film Co., Ltd.
- 当前专利权人地址： JP Kanagawa
- 代理机构： Sughrue Mion, PLLC
- 优先权： JP2002-261401 20020906
- 主分类号： G03F7/004
- IPC分类号： G03F7/004 ; G03F7/038 ; G03F7/039 ; H01L21/027 ; G03C5/00
摘要：
A negative type resist composition comprising: (A1) a compound generating a sulfonic acid upon irradiation with actinic rays or a radiation and having the specific formula, (A2) a compound generating a sulfonic acid upon irradiation with actinic rays or a radiation and having the specific structure, (B) an alkali-soluble resin, and (C) a crosslinking agent capable of carrying out an addition reaction with the alkali-soluble resin which is the component (B) by the action of an acid.
公开/授权文献
- US20040058272A1 Resist composition 公开/授权日：2004-03-25
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