Invention Grant
US06903338B2 Method and apparatus for reducing substrate edge effects in electron lenses
有权
减少电子透镜中基板边缘效应的方法和装置
- Patent Title: Method and apparatus for reducing substrate edge effects in electron lenses
- Patent Title (中): 减少电子透镜中基板边缘效应的方法和装置
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Application No.: US10600050Application Date: 2003-06-20
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Publication No.: US06903338B2Publication Date: 2005-06-07
- Inventor: Marian Mankos , David L. Adler
- Applicant: Marian Mankos , David L. Adler
- Applicant Address: US CA Milpitas
- Assignee: KLA-Tencor Technologies Corporation
- Current Assignee: KLA-Tencor Technologies Corporation
- Current Assignee Address: US CA Milpitas
- Agency: Okamoto & Benedicto LLP
- Main IPC: H01L21/66
- IPC: H01L21/66 ; G01N23/203 ; G01Q30/02 ; G01Q30/20 ; G21K7/00 ; H01J37/20 ; H01J37/244 ; H01J37/28

Abstract:
One embodiment disclosed pertains to a method for inspecting a substrate. The method includes inserting the substrate into a holding place of a substrate holder, moving the substrate holder under an electron beam, and applying a voltage to a conductive element of the substrate holder. The voltage applied to the conductive element reduces a substrate edge effect. Another embodiment disclosed relates to an apparatus for holding a substrate that reduces a substrate edge effect. The apparatus includes a holding place for insertion of the substrate and a conductive element. The conductive element is positioned so as to be located within a gap between an edge of the holding place and an edge of the substrate.
Public/Granted literature
- US20040149906A1 Method and apparatus for reducing substrate edge effects in electron lenses Public/Granted day:2004-08-05
Information query
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