Invention Grant
US06903338B2 Method and apparatus for reducing substrate edge effects in electron lenses 有权
减少电子透镜中基板边缘效应的方法和装置

Method and apparatus for reducing substrate edge effects in electron lenses
Abstract:
One embodiment disclosed pertains to a method for inspecting a substrate. The method includes inserting the substrate into a holding place of a substrate holder, moving the substrate holder under an electron beam, and applying a voltage to a conductive element of the substrate holder. The voltage applied to the conductive element reduces a substrate edge effect. Another embodiment disclosed relates to an apparatus for holding a substrate that reduces a substrate edge effect. The apparatus includes a holding place for insertion of the substrate and a conductive element. The conductive element is positioned so as to be located within a gap between an edge of the holding place and an edge of the substrate.
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