公开(公告)号：US06803571B1

公开(公告)日：2004-10-12

申请号：US10607226

申请日：2003-06-26

申请人： Marian Mankos ,  David L. Adler

发明人： Marian Mankos ,  David L. Adler

IPC分类号： H01J3726

CPC分类号： H01J37/26 ,  G01N23/225 ,  H01J37/1472 ,  H01J2237/0044 ,  H01J2237/262

摘要： In accordance with one embodiment, the disclosure pertains to an apparatus for inspection of substrates. The apparatus includes at least a dual-energy e-beam source, an energy-dependent dispersive device, a beam separator, and an objective lens. The dual-energy e-beam source is configured to generate both a higher-energy e-beam component and a lower-energy e-beam component. Said two components exit the dual-energy e-source co-axially. The energy-dispersive device is configured to introduce dispersion between the two components. The components exit the dispersive device at different angles of trajectory. The beam separator is configured to receive the two dispersed components and substantially cancel the dispersion previously introduced by the dispersive device. As a result, the two components are rejoined in trajectory. Finally, the objective lens configured to focus said two rejoined components onto an area of the substrate.

摘要翻译： 根据一个实施例，本公开涉及用于检查基板的装置。 该装置至少包括双能量电子束源，能量依赖色散装置，光束分离器和物镜。 双能量电子束源被配置为产生较高能量的电子束分量和较低能量的电子束分量。 所述两个部件同轴地离开双能源电子源。 能量分散装置被配置为在两个部件之间引入分散体。 组件以不同的轨迹角度离开色散装置。 束分离器被配置为接收两个分散的组分并且基本上消除先前由分散装置引入的分散体。 结果，两个组件在轨迹上重新加入。 最后，物镜被配置为将所述两个重新连接的组件聚焦到衬底的一个区域上。

公开(公告)号：US07009177B1

公开(公告)日：2006-03-07

申请号：US11040281

申请日：2005-01-20

申请人： Marian Mankos ,  Luca Grella ,  David L. Adler

发明人： Marian Mankos ,  Luca Grella ,  David L. Adler

IPC分类号： H01J37/26

CPC分类号： H01J37/1478 ,  H01J37/29 ,  H01J2237/2538

摘要： One embodiment disclosed relates to an apparatus for inspecting a substrate using charged particles. The apparatus includes an illumination subsystem, an objective subsystem, a projection subsystem, and a beam separator interconnecting those subsystems. Advantageously, the illumination subsystem includes a tilt deflector configured to controllably tilt the incident beam. The tilt of the incident beam caused by the tilt deflector is magnified prior to the incident beam impinging onto the substrate. This technique allows for achieving large beam tilts at the substrate without lens aberrations caused by introducing tilt at the objective lens and without complications due to using a tiltable stage. Other embodiments are also disclosed.

摘要翻译： 公开的一个实施例涉及一种使用带电粒子检查基板的装置。 该装置包括照明子系统，客观子系统，投影子系统和互连这些子系统的分束分离器。 有利地，照明子系统包括被配置为可控地倾斜入射光束的倾斜偏转器。 在入射光束撞击到基板上之前，由倾斜偏转器引起的入射光束的倾斜被放大。 该技术允许在基板处实现大的光束倾斜，而不会由于在物镜处引入倾斜而导致的透镜像差，并且由于使用可倾斜的台而不会产生并发症。 还公开了其他实施例。

公开(公告)号：US06870172B1

公开(公告)日：2005-03-22

申请号：US10851040

申请日：2004-05-21

申请人： Marian Mankos ,  Harald F. Hess ,  David L. Adler ,  Kirk J. Bertsche

发明人： Marian Mankos ,  Harald F. Hess ,  David L. Adler ,  Kirk J. Bertsche

IPC分类号： H01J37/317

CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J2237/31789

摘要： One embodiment disclosed relates to an apparatus for reflection electron beam lithography. An electron source is configured to emit electrons. The electrons are reflected to a target substrate by portions of an electron-opaque patterned structure having a lower voltage level and are absorbed by portions of the structure having a higher voltage level. Another embodiment relates to a novel method of electron beam lithography. An incident electron beam is formed and directed to an opaque patterned structure. Electrons are reflected from portions of the structure having a lower voltage level applied thereto and are absorbed by portions of the structure having a higher voltage level applied thereto. The reflected electrons are directed towards a target substrate to form an image and expose a lithographic pattern.

摘要翻译： 所公开的一个实施例涉及用于反射电子束光刻的装置。 电子源被配置为发射电子。 电子被具有较低电压电平的电子不透明图案结构的一部分反射到目标衬底，并被具有较高电压电平的结构的部分吸收。 另一实施例涉及电子束光刻的新颖方法。 形成入射电子束并且引导到不透明的图案结构。 电子被施加到其上的具有较低电压电平的结构的部分反射并被施加到其上的具有较高电压电平的结构的部分吸收。 反射的电子被引向目标衬底以形成图像并暴露光刻图案。

公开(公告)号：US07816655B1

公开(公告)日：2010-10-19

申请号：US10851041

申请日：2004-05-21

申请人： Harald F. Hess ,  Marian Mankos ,  David L. Adler

发明人： Harald F. Hess ,  Marian Mankos ,  David L. Adler

IPC分类号： H01J37/04

CPC分类号： H01J37/3175 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3177 ,  H01J2237/2482 ,  H01J2237/31789

摘要： One embodiment disclosed relates to a reflective electron patterning device. The device includes a pattern on a surface. There is an electron reflective portion of the pattern and an electron non-reflective portion of the pattern. Another embodiment disclosed relates to a method of reflecting a pattern of electrons. An electron beam is generated to be incident upon a surface. The pattern is formed on the surface. The incident electrons are reflected from a reflective portion of the pattern are prevented from being reflected from a non-reflective portion of the pattern.

摘要翻译： 公开的一个实施例涉及一种反射型电子图案形成装置。 该装置包括表面上的图案。 图案的电子反射部分和图案的电子非反射部分。 所公开的另一实施例涉及一种反映电子图案的方法。 产生电子束入射到表面上。 图案形成在表面上。 从图案的反射部分反射的入射电子被防止从图案的非反射部分反射。

公开(公告)号：US06858843B1

公开(公告)日：2005-02-22

申请号：US10177394

申请日：2002-06-21

申请人： Marian Mankos ,  David L. Adler

发明人： Marian Mankos ,  David L. Adler

IPC分类号： G01N23/225 ,  G01Q30/02 ,  G21K7/00 ,  H01J37/141 ,  H01J3/14 ,  G01N23/00 ,  H01J3/26

CPC分类号： G01N23/2251 ,  H01J37/141 ,  H01J2237/1035 ,  H01J2237/28

摘要： Disclosed is an apparatus for electron beam inspection of a specimen with improved potential throughput. The apparatus includes an immersion objective lens focusing the primary electrons into a beam that impinges onto a spot on the specimen. Also disclosed is a method for automatic electron beam inspection of a specimen. The method includes producing a magnetic field towards the specimen that reduces aberration towards an outer portion of the multiple pixel imaging region.

摘要翻译： 公开了一种具有改善的潜在产量的样品的电子束检查装置。 该装置包括将初级电子聚焦成撞击样品上的斑点的光束的浸没物镜。 还公开了一种用于样品的自动电子束检查的方法。 该方法包括向样本产生朝向多像素成像区域的外部部分减小像差的磁场。

公开(公告)号：US06812461B1

公开(公告)日：2004-11-02

申请号：US10290014

申请日：2002-11-07

申请人： David L. Adler ,  Marian Mankos

发明人： David L. Adler ,  Marian Mankos

IPC分类号： H01J3773

CPC分类号： H01J37/29 ,  G01N23/203 ,  H01J1/34 ,  H01J3/021 ,  H01J37/073 ,  H01J37/244 ,  H01J2237/06316 ,  H01J2237/2817

摘要： One embodiment disclosed is an electron beam apparatus for examination of a specimen. The apparatus includes a photocathode source, an objective lens, a beam separator, and a projection lens. The photocathode source generates a primary electron beam with reduced energy spread. The low energy spread beam is focused onto the specimen by the objective lens. The beam separator separates a scattered electron beam from the primary electron beam, and the projection lens images the scattered electron beam. Software routines may analyze the image data for purposes of automated inspection or review.

摘要翻译： 公开的一个实施例是用于检查样本的电子束装置。 该装置包括光电阴极源，物镜，光束分离器和投影透镜。 光电阴极源产生具有降低的能量传播的一次电子束。 低能量扩散光束通过物镜聚焦在样品上。 光束分离器将分散的电子束与一次电子束分离，并且投影透镜对散射的电子束进行成像。 软件程序可以分析图像数据，以便进行自动检查或检查。

公开(公告)号：US07514681B1

公开(公告)日：2009-04-07

申请号：US11451698

申请日：2006-06-13

申请人： Paul F. Marella ,  Mark A. McCord ,  Marian Mankos ,  David L. Adler

发明人： Paul F. Marella ,  Mark A. McCord ,  Marian Mankos ,  David L. Adler

IPC分类号： H01L21/02 ,  H01J37/145 ,  G21K7/00

CPC分类号： H01J37/244 ,  H01J37/05 ,  H01J37/292 ,  H01J2237/24485 ,  H01J2237/24592 ,  H01J2237/2594 ,  H01J2237/2817

摘要： One embodiment relates to a method of inspecting a substrate using electrons. Mirror-mode electron-beam imaging is performed on a region of the substrate at multiple voltage differences between an electron source and a substrate, and image data is stored corresponding to the multiple voltage differences. A calculation is made of a measure of variation of an imaged aspect of a feature in the region with respect to the voltage difference between the electron source and the substrate. Other embodiments and features are also disclosed.

摘要翻译： 一个实施例涉及使用电子检查衬底的方法。 在电子源和衬底之间的多个电压差的基板的区域上执行镜像电子束成像，并且对应于多个电压差存储图像数据。 计算相对于电子源和基板之间的电压差的该区域中特征的成像方面的变化的度量。 还公开了其它实施例和特征。

公开(公告)号：US06903338B2

公开(公告)日：2005-06-07

申请号：US10600050

申请日：2003-06-20

申请人： Marian Mankos ,  David L. Adler

发明人： Marian Mankos ,  David L. Adler

IPC分类号： H01L21/66 ,  G01N23/203 ,  G01Q30/02 ,  G01Q30/20 ,  G21K7/00 ,  H01J37/20 ,  H01J37/244 ,  H01J37/28

CPC分类号： H01J37/20 ,  H01J2237/153 ,  Y10T428/12528

摘要： One embodiment disclosed pertains to a method for inspecting a substrate. The method includes inserting the substrate into a holding place of a substrate holder, moving the substrate holder under an electron beam, and applying a voltage to a conductive element of the substrate holder. The voltage applied to the conductive element reduces a substrate edge effect. Another embodiment disclosed relates to an apparatus for holding a substrate that reduces a substrate edge effect. The apparatus includes a holding place for insertion of the substrate and a conductive element. The conductive element is positioned so as to be located within a gap between an edge of the holding place and an edge of the substrate.

摘要翻译： 所公开的一个实施例涉及用于检查基板的方法。 该方法包括将基板插入基板保持器的保持位置，将基板保持器移动到电子束下方，并向基板保持器的导电元件施加电压。 施加到导电元件的电压降低了衬底边缘效应。 公开的另一实施例涉及一种用于保持降低衬底边缘效应的衬底的装置。 该装置包括用于插入基板和导电元件的保持位置。 导电元件被定位成位于保持位置的边缘和基板的边缘之间的间隙内。

公开(公告)号：US08258474B1

公开(公告)日：2012-09-04

申请号：US13071412

申请日：2011-03-24

申请人： Marian Mankos

发明人： Marian Mankos

IPC分类号： H01J37/26

CPC分类号： H01J37/261 ,  H01J37/04 ,  H01J37/252 ,  H01J2237/04926 ,  H01J2237/2538

摘要： One embodiment relates to an apparatus for generating two spatially overlapping electron beams on a specimen. A first electron beam source is configured to generate a low-energy electron beam, and an energy-dispersive device bends the low-energy electron beam towards an semitransparent electron mirror. The semitransparent electron mirror is biased to reflect the low-energy electron beam. A second electron beam source is configured to generate a high-energy electron beam that passes through an opening in the semitransparent electron mirror. Both the low- and high-energy electron beams enter the same energy-dispersive device that bends both beams towards the specimen. A deflection system positioned between the high-energy electron source and semitransparent electron mirror is configured to deflect the high-energy electron beam by an angle that compensates for the difference in bending angles between the low- and high-energy electron beams introduced by the energy-dispersive device. Other embodiments are also disclosed.

摘要翻译： 一个实施例涉及用于在样本上产生两个空间上重叠的电子束的装置。 第一电子束源被配置为产生低能电子束，并且能量分散器件将低能电子束弯曲成半透明电子镜。 半透明电子镜被偏置以反射低能电子束。 第二电子束源被配置为产生穿过半透明电子反射镜中的开口的高能电子束。 低能量和高能量电子束都进入同样的能量分散装置，使两个光束朝向样品弯曲。 位于高能电子源和半透明电子反射镜之间的偏转系统被配置为使高能电子束偏转角度，该角度补偿由能量引入的低能量和高能量电子束之间的弯曲角度的差异 - 分散设备 还公开了其他实施例。

公开(公告)号：US07692167B1

公开(公告)日：2010-04-06

申请号：US11588492

申请日：2006-10-26

申请人： Marian Mankos

发明人： Marian Mankos

IPC分类号： H01J37/302

CPC分类号： H01J37/3175 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3026 ,  H01J37/3174 ,  H01J2237/30483 ,  H01J2237/31789

摘要： One embodiment pertains to an apparatus for reflection electron beam lithography, including at least illumination electron-optics, an electron-reflective pattern generator, projection electron-optics, a moving stage holding a target substrate, control circuitry, and a deflection system. The illumination electron-optics is configured to form an illumination electron beam. The electron-reflective pattern generator configured to generate an electron-reflective pattern of pixels and to reflect the illumination electron beam using the pattern to form a patterned electron beam. The projection electron-optics is configured to project the patterned electron beam onto the moving target substrate. The control circuitry is configured to shift the generated pattern in discrete steps in synchronization with the stage motion. The deflection system is configured to deflect said projected patterned electron beam so as to compensate for said stage motion in between discrete shifts of said generated pattern. Other features and embodiments are also disclosed.

摘要翻译： 一个实施例涉及用于反射电子束光刻的装置，至少包括照明电子光学，电子反射图案发生器，投射电子光学，保持目标衬底的移动台，控制电路和偏转系统。 照明电子光学被配置为形成照明电子束。 电子反射型图形发生器被配置为产生像素的电子反射图案并且使用该图案反射照射电子束以形成图案化的电子束。 投影电子学被配置为将图案化电子束投影到移动目标衬底上。 控制电路被配置为与台阶运动同步地以离散步进移位生成的图案。 偏转系统被配置为偏转所述投影的图案化电子束，以补偿所述生成图案的离散位移之间的所述阶段运动。 还公开了其它特征和实施例。