公开(公告)号：US20200090826A1

公开(公告)日：2020-03-19

申请号：US16690103

申请日：2019-11-20

申请人： David L. Adler

发明人： David L. Adler

IPC分类号： G21K1/00 ,  G01N23/04 ,  H01L23/498 ,  H01L27/02 ,  H01J1/78

摘要： An apparatus is disclosed for the examination and inspection of integrated devices such as integrated circuits. X-rays are transmitted through the integrated device, and are incident on a photoemissive structure that absorbs x-rays and emits electrons. The electrons emitted by the photoemissive structure are shaped by an electron optical system to form a magnified image of the emitted electrons on a detector. This magnified image is then recorded and processed. For some embodiments of the invention, the photoemissive structure is deposited directly onto the integrated device. In some embodiments, the incidence angle of the x-rays is varied to allow internal three-dimensional structures of the integrated device to be determined. In some embodiments, the recorded image is compared with a reference data to enable inspection for manufacturing quality control.

公开(公告)号：US06897444B1

公开(公告)日：2005-05-24

申请号：US10702271

申请日：2003-11-06

申请人： David L. Adler

发明人： David L. Adler

IPC分类号： G01N23/225 ,  G01Q30/02 ,  G01Q30/04 ,  H01J37/26 ,  H01J37/29 ,  H01J37/153

CPC分类号： H01J37/26 ,  G01N23/225 ,  H01J37/29 ,  H01J2237/24592 ,  H01J2237/2538 ,  H01J2237/2817

摘要： One embodiment disclosed is a method of detecting defects in objects. A selected surface area of an object is inspected with a multi-pixel electron microscope, and first set of data is generated having signal values representing image content of each pixel thereof. Further selected surface area of the object is inspected with said multi-pixel electron microscope, and second set of data is generated having signal values representing image content of each pixel thereof. Corresponding portions of first and second sets of data are stored in memory. Misalignment between stored portions of the first and second sets of data is detected with resolution of a fraction of a pixel, and the stored portions of first and second sets of data are aligned using subpixel interpolation to correct the detected misalignment therebetween. Finally, corresponding subportions of the aligned portions of first and second sets of data are compared to detect differences therebetween.

摘要翻译： 公开的一个实施例是检测物体中的缺陷的方法。 用多像素电子显微镜检查物体的选择的表面积，并且生成具有表示其每个像素的图像内容的信号值的第一组数据。 用所述多像素电子显微镜检查物体的另外选择的表面积，并且生成具有表示其每个像素的图像内容的信号值的第二组数据。 第一和第二组数据的相应部分被存储在存储器中。 以分辨率为单位的像素的分辨率来检测第一和第二组数据的存储部分之间的对准，并且使用子像素插值来对齐第一组数据和第二组数据的存储部分，以校正其间检测到的不对准。 最后，比较第一和第二组数据的对准部分的相应子部分，以检测它们之间的差异。

公开(公告)号：US06570154B1

公开(公告)日：2003-05-27

申请号：US09786137

申请日：2001-06-11

申请人： Douglas K. Masnaghetti ,  Stefano E. Concina ,  Stanley S. Sun ,  Waiman Ng ,  David L. Adler

发明人： Douglas K. Masnaghetti ,  Stefano E. Concina ,  Stanley S. Sun ,  Waiman Ng ,  David L. Adler

IPC分类号： H01J37244

CPC分类号： H01J37/28

摘要： A method and apparatus for generating an image of a specimen with a scanning electron microscope (SEM) is disclosed. The SEM (200) has a source unit (202 through 220) for directing an electron beam (203) substantially towards a portion of the specimen (222), a detector (224) for detecting particles (205) that are emitted from the specimen (222), and an image generator (234 through 242) for generating the image of the specimen (222) from the emitted particles (205). The image features are controlled by conditions under which the image is generated. The specimen is scanned under a first set of conditions (252) to generate a first image during a first image phase (302, 402). The specimen is then scanned under a second set conditions (254) during a setup phase (304, 404). The second set of conditions is selected to control charge on the specimen. The specimen is then scanned under the first set of conditions (252) to generate a second image during a second image phase (306, 406). The features of the second image are controlled by the first and second sets of conditions.

摘要翻译： 公开了一种用扫描电子显微镜（SEM）产生样本图像的方法和装置。 扫描电子显微镜（200）具有源单元（202至220），用于基本上朝向样本（222）的一部分引导电子束（203）;检测器（224），用于检测从样本发射的颗粒（205） （222），以及用于从所发射的颗粒（205）产生样本（222）的图像的图像发生器（234至242）。 图像特征由生成图像的条件控制。 在第一组条件（252）下扫描样本，以在第一图像相位期间产生第一图像（302,402）。 然后在设置阶段（304,404）期间，在第二设定条件（254）下扫描样本。 选择第二组条件来控制样品上的电荷。 然后在第一组条件（252）下扫描样本，以在第二图像相位期间产生第二图像（306,406）。 第二图像的特征由第一和第二组条件控制。

公开(公告)号：US6066849A

公开(公告)日：2000-05-23

申请号：US149767

申请日：1998-09-08

申请人： Douglas K. Masnaghetti ,  Stefano E. Concina ,  Stanley S. Sun ,  Waiman Ng ,  David L. Adler

发明人： Douglas K. Masnaghetti ,  Stefano E. Concina ,  Stanley S. Sun ,  Waiman Ng ,  David L. Adler

IPC分类号： H01L21/66 ,  H01J37/20 ,  H01J37/22 ,  H01J37/248 ,  H01J37/28 ,  H01J37/244

CPC分类号： H01J37/28 ,  H01J2237/004 ,  H01J2237/2817

摘要： A method and apparatus for generating an image of a specimen with a scanning electron microscope (SEM) is disclosed. The SEM has a source unit for directing an electron beam substantially towards a portion of the specimen, a detector for detecting particles that are emitted from the specimen, and an image generator for generating the image of the specimen from the emitted particles. The image features are controlled by conditions under which the image is generated. The specimen is scanned under a first set of conditions to generate a first image during a first image phase. The specimen is then scanned under a second set of conditions during a setup phase. The second set of conditions are selected to control charge on the specimen. The specimen is then scanned under the first set of conditions to generate a second image during a second image phase. The features of the second image are controlled by the first and second sets of conditions.

摘要翻译： 公开了一种用扫描电子显微镜（SEM）产生样本图像的方法和装置。 SEM具有用于将电子束基本上朝向样本的一部分引导的源单元，用于检测从样本发射的颗粒的检测器，以及用于从所发射的颗粒产生样本的图像的图像发生器。 图像特征由生成图像的条件控制。 在第一组条件下扫描样本以在第一图像阶段期间产生第一图像。 然后在设置阶段，在第二组条件下扫描样品。 选择第二组条件来控制样品上的电荷。 然后在第一组条件下扫描样品，以在第二图像阶段期间产生第二图像。 第二图像的特征由第一和第二组条件控制。

公开(公告)号：US11619596B2

公开(公告)日：2023-04-04

申请号：US17721191

申请日：2022-04-14

申请人： David L. Adler

发明人： David L. Adler

IPC分类号： G01N23/04 ,  H01J1/78 ,  H01L27/02 ,  H01L23/498 ,  G21K1/00 ,  G01N23/044 ,  G21K7/00

摘要： A system is disclosed for the examination and inspection of integrated devices such as integrated circuits using 3-D laminography. X-rays are transmitted through the integrated device, and are incident on a photoemissive structure that absorbs x-rays and emits electrons. The electrons emitted by the photoemissive structure are shaped by an electron optical system to form a magnified image of the emitted electrons on a detector. This magnified image is then recorded and processed. In some embodiments, the incidence angle of the x-rays is varied to gather multiple images that allow internal three-dimensional structures of the integrated device to be determined using computed laminography. In some embodiments, the recorded images are compared with reference data to enable inspection for manufacturing quality control.

公开(公告)号：US08995622B2

公开(公告)日：2015-03-31

申请号：US13373554

申请日：2011-11-18

申请人： David L. Adler ,  Wenbing Yun ,  Thomas Anthony Case

发明人： David L. Adler ,  Wenbing Yun ,  Thomas Anthony Case

IPC分类号： H01J35/08 ,  H05G1/52 ,  H01J35/14

CPC分类号： H01J35/08 ,  H01J35/14 ,  H01J2235/087 ,  H01J2235/186 ,  H05G1/52

摘要： An x-ray source is described. During operation of the x-ray source, an electron source emits a beam of electrons. This beam of electrons is focused to a spot on a target by a magnetic focusing lens. In response to receiving the beam of focused electrons, the target provides a transmission source of x-rays. Moreover, a repositioning mechanism selectively repositions the beam of focused electrons to different locations on a surface of the target based on a feedback parameter associated with operation of the x-ray source. This feedback parameter may be based on: an intensity of the x-rays output by the x-ray source; a position of the x-rays output by the x-ray source; an elapsed time during operation of the x-ray source; a cross-sectional shape of the x-rays output by the x-ray source; and/or a spot size of the x-rays output by the x-ray source.

摘要翻译： 描述了x射线源。 在x射线源的操作期间，电子源发射电子束。 该电子束通过磁聚焦透镜聚焦到目标上的点。 响应于接收聚焦电子束，目标提供x射线的透射源。 此外，重新定位机构基于与x射线源的操作相关联的反馈参数，有选择地将聚焦电子束重新定位在目标表面上的不同位置。 该反馈参数可以基于：由x射线源输出的x射线的强度; 由x射线源输出的x射线的位置; 在x射线源的操作期间经过的时间; 由x射线源输出的x射线的横截面形状; 和/或由x射线源输出的x射线的斑点大小。

公开(公告)号：US08831179B2

公开(公告)日：2014-09-09

申请号：US13066679

申请日：2011-04-21

申请人： David L. Adler ,  Wenbing Yun ,  Thomas Anthony Case

发明人： David L. Adler ,  Wenbing Yun ,  Thomas Anthony Case

IPC分类号： H01J35/02 ,  H01J35/08 ,  H01J35/14

CPC分类号： H01J35/08 ,  H01J35/14 ,  H01J2235/087 ,  H01J2235/186 ,  H05G1/52

摘要： During operation of an x-ray source, an electron source emits a beam of electrons. Moreover, a repositioning mechanism selectively repositions the beam of electrons on a surface of a target based on a feedback parameter, where a location of the beam of electrons on the surface of the target defines a spot size of x-rays output by the x-ray source. In response to receiving the beam of electrons, the target provides a transmission source of the x-rays. Furthermore, a beam-parameter detector provides the feedback parameter based on a physical characteristic associated with the beam of electrons and/or the x-rays output by the x-ray source. This physical characteristic may include: at least a portion of an optical spectrum emitted by the target, secondary electrons emitted by the target based on a cross-sectional shape of the beam of electrons; an intensity of the x-rays output by the target; and/or a current from the target.

摘要翻译： 在x射线源的操作期间，电子源发射电子束。 此外，重新定位机构基于反馈参数选择性地重新定位靶的表面上的电子束，其中目标表面上的电子束的位置限定由x轴输出的x射线的光斑尺寸， 射线源。 响应于接收到电子束，目标提供x射线的透射源。 此外，光束参数检测器基于与电子束相关联的物理特性和/或由x射线源输出的x射线提供反馈参数。 该物理特性可以包括：由目标发射的光谱的至少一部分，基于电子束的横截面形状由靶发射的二次电子; 目标输出的x射线的强度; 和/或来自目标的电流。

公开(公告)号：US20120269326A1

公开(公告)日：2012-10-25

申请号：US13373555

申请日：2011-11-18

申请人： David L. Adler ,  William Ansel MacKie

发明人： David L. Adler ,  William Ansel MacKie

IPC分类号： H01J35/14

CPC分类号： H01J35/08 ,  H01J35/116 ,  H01J35/14 ,  H01J35/186 ,  H05G1/52

摘要： An x-ray source is described. This x-ray source includes an electron source with a refractory binary compound having a melting temperature greater than that of tungsten. For example, the refractory binary compound may include: hafnium carbide, zirconium carbide, tantalum carbide, lanthanum hexaboride and/or compounds that include two or more of these elements.

摘要翻译： 描述了x射线源。 该X射线源包括具有熔融温度大于钨的熔融温度的难熔二元化合物的电子源。 例如，耐火二元化合物可以包括：碳化铪，碳化锆，碳化钽，六硼化镧和/或包括这些元素中的两种或更多种的化合物。

公开(公告)号：US07660687B1

公开(公告)日：2010-02-09

申请号：US11420243

申请日：2006-05-25

申请人： Indranil De ,  Mark A. McCord ,  David L. Adler

发明人： Indranil De ,  Mark A. McCord ,  David L. Adler

IPC分类号： G01D18/00 ,  G06F17/40 ,  G06F19/00

CPC分类号： H01J37/222 ,  G01R31/307 ,  H01J37/263 ,  H01J37/28 ,  H01J2237/2826

摘要： A method of increasing consistency between separate parametric measurement readings that are taken with an electron beam imaging tool at different times within a period of time, by correcting drift in the imaging tool at a time frequency that is less than a time period during which the drift is anticipated to be undesirably large.

摘要翻译： 一种提高在一段时间内在不同时间用电子束成像工具拍摄的单独的参数测量读数之间的一致性的方法，通过以小于漂移的时间段的时间频率校正成像工具中的漂移， 预计将不合需要。

公开(公告)号：US07391033B1

公开(公告)日：2008-06-24

申请号：US11257304

申请日：2005-10-24

申请人： David L Adler

发明人： David L Adler

IPC分类号： G01K1/08

CPC分类号： H01J37/3177 ,  B82Y10/00 ,  B82Y40/00

摘要： One embodiment described relates to a multiple electron beam apparatus. Multiple columns are arranged in a row configured to generate multiple electron beams. A mechanism is included for translating a substrate so as to be impinged upon by the multiple electron beams. A direction of the substrate translation and a direction of the row of columns are at a skew angle.

摘要翻译： 所描述的一个实施例涉及多电子束装置。 配置成一行的多列被配置成产生多个电子束。 包括用于平移衬底以被多个电子束照射的机构。 基板平移的方向和列列的方向处于偏斜角。