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US06903995B2 Test structure for the measurement of contact to gate distance in non-volatile memory devices and corresponding test method 失效
用于测量非易失性存储器件中接触栅极距离的测试结构和相应的测试方法

Test structure for the measurement of contact to gate distance in non-volatile memory devices and corresponding test method
摘要:
An integrated non-volatile memory device may include a first matrix of memory cells organized into rows (or word lines) and columns (or bit lines), corresponding row and column decoding circuits, and read, modify and erase circuits for reading and modifying data stored in the memory cells. Furthermore, the memory device may also include a test structure including a second matrix of memory cells smaller than the first. The second memory matrix may include word line couplings each having a different contact to gate distance. That is, each coupling is aligned a different distance from its respective gate than adjacent couplings.
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