Invention Grant
- Patent Title: Semiconductor integrated circuit device
- Patent Title (中): 半导体集成电路器件
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Application No.: US10644777Application Date: 2003-08-21
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Publication No.: US06906575B2Publication Date: 2005-06-14
- Inventor: Hitoshi Tanaka
- Applicant: Hitoshi Tanaka
- Applicant Address: JP Tokyo JP Kodaira
- Assignee: Renesas Technology Corp.,Hitachi ULSI Systems Co., Ltd.
- Current Assignee: Renesas Technology Corp.,Hitachi ULSI Systems Co., Ltd.
- Current Assignee Address: JP Tokyo JP Kodaira
- Agency: Antonelli, Terry, Stout & Kraus, LLP
- Priority: JP11-135557 19990517
- Main IPC: G11C5/14
- IPC: G11C5/14 ; G11C11/4074 ; H02M3/07 ; H03K19/0175 ; G05F3/02

Abstract:
A semiconductor integrated circuit device having an internal voltage generating circuit which generates a voltage two or more times higher than an operating voltage while at the same time reducing the voltage applied to a device, thereby ensuring the device reliability. In a charge pump circuit driven by supply voltage VDD, a maximum of 2 VDD or a similar level voltage is applied between the drain and source of a MOSFET, the MOSFET being connected in series with a conduction MOSFET of the same type, the gate of which is supplied with VD−VDD, or a potential which is VDD lower than VD, the drain potential before its connection. The gate potential is obtained directly from a node in said charge pump which generates a voltage pulse synchronized with the voltage between the drain and source of that MOSFET, or through another rectifier device branched via a capacitor from the node.
Public/Granted literature
- US20040004512A1 Semiconductor integrated circuit device Public/Granted day:2004-01-08
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