发明授权
- 专利标题： Pellicle for a lithographic lens
- 专利标题（中）： 光刻胶片的薄膜
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申请号： US10790412申请日： 2004-03-01
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公开(公告)号： US06906777B1公开(公告)日： 2005-06-14
- 发明人: Jongwook Kye , Carl P. Babcock , Christopher F. Lyons
- 申请人： Jongwook Kye , Carl P. Babcock , Christopher F. Lyons
- 申请人地址： US CA Sunnyvale
- 专利权人： Advanced Micro Devices, Inc.
- 当前专利权人： Advanced Micro Devices, Inc.
- 当前专利权人地址： US CA Sunnyvale
- 代理机构： Renner, Otto, Boisselle & Sklar, LLP
- 主分类号： G03F7/20
- IPC分类号： G03F7/20 ; G03B27/32 ; G03B27/52 ; G03B27/54
摘要：
A method and apparatus for preventing contamination in a lithographic apparatus including a projection system, including providing the lithographic apparatus including the projection system for imaging an irradiated portion of a mask onto a target portion of a substrate and placing a pellicle over a surface of the projection system to inhibit contamination of the surface.
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