发明授权
US06918820B2 Polishing compositions comprising polymeric cores having inorganic surface particles and method of use
失效
抛光组合物包含具有无机表面颗粒的聚合物芯和使用方法
- 专利标题： Polishing compositions comprising polymeric cores having inorganic surface particles and method of use
- 专利标题（中）： 抛光组合物包含具有无机表面颗粒的聚合物芯和使用方法
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申请号： US10411735申请日： 2003-04-11
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公开(公告)号： US06918820B2公开(公告)日： 2005-07-19
- 发明人: Dennis E. Smith , Suryadevara V. Babu
- 申请人： Dennis E. Smith , Suryadevara V. Babu
- 申请人地址： US NY Rochester
- 专利权人： Eastman Kodak Company
- 当前专利权人： Eastman Kodak Company
- 当前专利权人地址： US NY Rochester
- 代理商 Chris P. Konkol
- 主分类号： C09G1/02
- IPC分类号： C09G1/02 ; C09K3/14 ; B24B1/00
摘要：
This invention relates generally to compositions and methods for removing adherent materials and polishing surfaces. In one embodiment, the method employs an improved media comprising core-shell particles. The media can be applied to microelectronic objects of manufacture.
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