发明授权
US06919161B2 Silicon-containing polymer, resist composition and patterning process
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含硅聚合物,抗蚀剂组合物和图案化工艺
- 专利标题: Silicon-containing polymer, resist composition and patterning process
- 专利标题(中): 含硅聚合物,抗蚀剂组合物和图案化工艺
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申请号: US10611261申请日: 2003-07-02
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公开(公告)号: US06919161B2公开(公告)日: 2005-07-19
- 发明人: Jun Hatakeyama , Takanobu Takeda , Toshinobu Ishihara
- 申请人: Jun Hatakeyama , Takanobu Takeda , Toshinobu Ishihara
- 申请人地址: JP Tokyo
- 专利权人: Shin-Etsu Chemical Co., Ltd.
- 当前专利权人: Shin-Etsu Chemical Co., Ltd.
- 当前专利权人地址: JP Tokyo
- 代理机构: Birch, Stewart, Kolasch & Birch, LLP
- 优先权: JP2002-192910 20020702
- 主分类号: C08F230/08
- IPC分类号: C08F230/08 ; G03F7/004 ; G03F7/039 ; G03F7/075
摘要:
Silicon-containing polymers comprising recurring units of formula (1) are novel wherein R1 is a single bond or alkylene, R2 is hydrogen or alkyl, R3, R4 and R5 are alkyl, haloalkyl, aryl or silicon-containing group, R6 is hydrogen, methyl, cyano or —C(═O)OR8 wherein R8 is hydrogen, alkyl or acid labile group, R7 is alkyl, —NR9R10 or —OR11 wherein R9, R10 and R11 are hydrogen or alkyl, a and b are positive numbers satisfying 0
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