发明授权
US06924455B1 Integrated plasma chamber and inductively-coupled toroidal plasma source
有权
集成等离子体室和电感耦合环形等离子体源
- 专利标题: Integrated plasma chamber and inductively-coupled toroidal plasma source
- 专利标题(中): 集成等离子体室和电感耦合环形等离子体源
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申请号: US09774165申请日: 2001-01-26
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公开(公告)号: US06924455B1公开(公告)日: 2005-08-02
- 发明人: Xing Chen , Donald K. Smith , William M. Holber
- 申请人: Xing Chen , Donald K. Smith , William M. Holber
- 申请人地址: US MA Wilmington
- 专利权人: Applied Science & Technology, Inc.
- 当前专利权人: Applied Science & Technology, Inc.
- 当前专利权人地址: US MA Wilmington
- 代理机构: Prokauer Rose LLP
- 主分类号: H01J27/16
- IPC分类号: H01J27/16 ; H01J37/32 ; B23K10/00
摘要:
A material processing apparatus having an integrated toroidal plasma source is described. The material processing apparatus includes a plasma chamber that comprises a portion of an outer surface of a process chamber. A transformer having a magnetic core surrounds a portion of the plasma chamber. The transformer has a primary winding. A solid state AC switching power supply comprising one or more switching semiconductor devices is coupled to a voltage supply and has an output that is coupled to the primary winding. The solid state AC switching power supply drives an AC current in the primary winding that induces an AC potential inside the chamber that directly forms a toroidal plasma that completes a secondary circuit of the transformer and dissociates the gas.