发明授权
US06926775B2 Reactors with isolated gas connectors and methods for depositing materials onto micro-device workpieces
失效
具有隔离气体连接器的反应器和用于将材料沉积到微器件工件上的方法
- 专利标题: Reactors with isolated gas connectors and methods for depositing materials onto micro-device workpieces
- 专利标题(中): 具有隔离气体连接器的反应器和用于将材料沉积到微器件工件上的方法
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申请号: US10365085申请日: 2003-02-11
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公开(公告)号: US06926775B2公开(公告)日: 2005-08-09
- 发明人: Craig M. Carpenter , Ross S. Dando , Danny Dynka
- 申请人: Craig M. Carpenter , Ross S. Dando , Danny Dynka
- 申请人地址: US ID Boise
- 专利权人: Micron Technology, Inc.
- 当前专利权人: Micron Technology, Inc.
- 当前专利权人地址: US ID Boise
- 代理机构: Perkins Coie LLP
- 主分类号: C23C16/44
- IPC分类号: C23C16/44 ; C23C16/455 ; C23C16/54 ; C23C16/00
摘要:
Reactors having gas distributors for depositing materials onto micro-device workpieces, systems that include such reactors, and methods for depositing materials onto micro-device workpieces are disclosed herein. In one embodiment, a reactor for depositing materials onto a micro-device workpiece includes a reaction chamber, a passageway, and a door assembly. The reaction chamber includes a gas distributor configured to provide a flow of gas(es) to a micro-device workpiece on a workpiece holder. The passageway, which has a first end open to the reaction chamber and a second end apart from the reaction chamber, is configured to provide ingression to and egression from the chamber for processing the micro-device workpiece. The door assembly is configured to open and sealably close a door at the second end of the passageway. A gas conditioning system positioned in the door is configured to maintain a desired concentration and phase of gas constituents in the passageway.