发明授权
US06927011B2 Resins for resists and chemically amplifiable resist compositions
有权
用于抗蚀剂和化学放大抗蚀剂组合物的树脂
- 专利标题： Resins for resists and chemically amplifiable resist compositions
- 专利标题（中）： 用于抗蚀剂和化学放大抗蚀剂组合物的树脂
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申请号： US10332770申请日： 2001-02-09
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公开(公告)号： US06927011B2公开(公告)日： 2005-08-09
- 发明人: Tadayuki Fujiwara , Yukiya Wakisaka , Toru Tokimitsu , Naoshi Murata , Yoshihiro Kamon , Hikaru Momose
- 申请人： Tadayuki Fujiwara , Yukiya Wakisaka , Toru Tokimitsu , Naoshi Murata , Yoshihiro Kamon , Hikaru Momose
- 申请人地址： JP Tokyo
- 专利权人： Mitsubishi Rayon Co., Ltd.
- 当前专利权人： Mitsubishi Rayon Co., Ltd.
- 当前专利权人地址： JP Tokyo
- 代理机构： Oblon, Spivak, McClelland, Maier & Neustadt, P.C.
- 优先权： JP2000-211381 20000712
- 国际申请： PCT/JP01/00946 WO 20010209
- 国际公布： WO02/04532 WO 20020117
- 主分类号： C08F20/28
- IPC分类号： C08F20/28 ; G03F7/039 ; G03F7/038
摘要：
A resist resin containing a monomer unit selected from the group comprising a monomer unit represented by Formula (II): wherein a substituent R3 represents an alkyl group, or a functional group comprising an acid-deprotectable protecting group, m representing the number of R3 is 0 (non-substitution), 1, 2 or more, R3 may be different from each other, provided that m is 2 or more, and n represents an integer of 0 to 4, has no rough spots on the surface after etching and so has good dry etching resistance, and therefore the resist resin is preferably used as a photo resist for DUV.
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