发明授权
US06936402B2 MONOMERS CONTAINING AN OXEPAN-2-ONE GROUP, PHOTORESIST COMPOSITIONS COMPRISING POLYMERS PREPARED FROM THE MONOMERS, METHODS FOR PREPARING THE COMPOSITIONS, AND METHODS FOR FORMING PHOTORESIST PATTERNS USING THE COMPOSITIONS
失效
包含OXEPAN-2-ONE组的单体，包含由单体制备的聚合物的光电组合物，用于制备组合物的方法，以及使用组合物形成光催化剂图案的方法
- 专利标题： MONOMERS CONTAINING AN OXEPAN-2-ONE GROUP, PHOTORESIST COMPOSITIONS COMPRISING POLYMERS PREPARED FROM THE MONOMERS, METHODS FOR PREPARING THE COMPOSITIONS, AND METHODS FOR FORMING PHOTORESIST PATTERNS USING THE COMPOSITIONS
- 专利标题（中）： 包含OXEPAN-2-ONE组的单体，包含由单体制备的聚合物的光电组合物，用于制备组合物的方法，以及使用组合物形成光催化剂图案的方法
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申请号： US10784806申请日： 2004-02-24
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公开(公告)号： US06936402B2公开(公告)日： 2005-08-30
- 发明人: Jin-Baek Kim , Tae-Hwan Oh , Jae-Hak Choi , Jae-Jun Lee
- 申请人： Jin-Baek Kim , Tae-Hwan Oh , Jae-Hak Choi , Jae-Jun Lee
- 申请人地址： KR Daejeon
- 专利权人： Korea Advanced Institute Science & Technology
- 当前专利权人： Korea Advanced Institute Science & Technology
- 当前专利权人地址： KR Daejeon
- 代理机构： Sterne, Kessler, Goldstein & Fox P.L.L.C.
- 优先权： KR10-2003-0058525 20030823
- 主分类号： C07D313/06
- IPC分类号： C07D313/06 ; C08F24/00 ; G03C1/73 ; G03C1/76 ; G03F7/039 ; G03F7/20 ; G03F7/30
摘要：
Disclosed herein is a novel norbornene, acrylate or methacrylate monomer as a photoresist monomer containing an oxepan-2-one group. Further disclosed are photoresist compositions comprising a polymer prepared from the monomer, methods for preparing the photoresist compositions, and methods for forming photoresist patterns using the photoresist compositions.