发明授权
- 专利标题： Method and its apparatus for inspecting particles or defects of a semiconductor device
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申请号： US10230416申请日： 2002-08-29
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公开(公告)号： US06936835B2公开(公告)日： 2005-08-30
- 发明人: Hidetoshi Nishiyama , Minori Noguchi , Yoshimasa Ohshima , Akira Hamamatsu , Kenji Watanabe , Tetsuya Watanabe , Takahiro Jingu
- 申请人： Hidetoshi Nishiyama , Minori Noguchi , Yoshimasa Ohshima , Akira Hamamatsu , Kenji Watanabe , Tetsuya Watanabe , Takahiro Jingu
- 申请人地址： JP Tokyo JP Tokyo
- 专利权人： Hitachi, Ltd.,Hitachi High-Tech Electronics Engineering Co., Ltd.
- 当前专利权人： Hitachi, Ltd.,Hitachi High-Tech Electronics Engineering Co., Ltd.
- 当前专利权人地址： JP Tokyo JP Tokyo
- 代理机构： Antonelli, Terry, Stout & Kraus, LLP
- 优先权： JP2000-291952 20000921; JP2001-288013 20010921
- 主分类号： G01N21/27
- IPC分类号： G01N21/27 ; G01N21/47 ; G01N21/88 ; G01N21/94 ; G01N21/95
摘要：
An apparatus for optically inspecting particles and/or defects correlates sizes of particles and/or defects to a cause of failure in an inspection result. A data processing circuit points out a cause of failure from the statistics on the inspection result, and displays information on the inspection result. A failure analysis is conducted by setting a threshold for identifying a failure in each of regions on a semiconductor device or the like to statistically evaluate detected particles.
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