Invention Grant
- Patent Title: Spin-valve head containing closed-flux-structure domain control films
- Patent Title (中): 旋转阀头包含封闭通量结构域控制膜
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Application No.: US10077854Application Date: 2002-02-20
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Publication No.: US06937449B2Publication Date: 2005-08-30
- Inventor: Hiroyuki Hoshiya , Masahiko Hatatani , Hisashi Kimura , Hiroshi Ide
- Applicant: Hiroyuki Hoshiya , Masahiko Hatatani , Hisashi Kimura , Hiroshi Ide
- Applicant Address: JP Tokyo
- Assignee: Hitachi, Ltd.
- Current Assignee: Hitachi, Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Antonelli, Terry, Stout & Kraus, LLP
- Priority: JP2001-177925 20010613
- Main IPC: G01R33/09
- IPC: G01R33/09 ; G11B5/39 ; H01F10/28 ; H01F10/32 ; H01L43/08

Abstract:
To provide a spin-valve type magnetic head having high read output even if track width is narrow and high stability, a magnetic head according to the invention is provided with a spin-valve type magnetoresistive element in which a single magnetic domain turning ferromagnetic layer is formed on a soft magnetic free layer via a non-magnetic separating layer, the soft magnetic free layer and the single magnetic domain turning ferromagnetic layer are magnetostatically coupled at the end of track width, a closed magnetic circuit is formed and the soft magnetic layer has magnetization substantially induced in a direction substantially perpendicular to an external magnetic field.
Public/Granted literature
- US20030206384A1 Spin-valve head containing closed-flux-structure domain control films Public/Granted day:2003-11-06
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