发明授权
- 专利标题： Thin film, method and apparatus for forming the same, and electronic component incorporating the same
- 专利标题（中）： 薄膜，其形成方法和装置以及包含该薄膜的电子部件
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申请号： US10378743申请日： 2003-03-04
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公开(公告)号： US06942903B2公开(公告)日： 2005-09-13
- 发明人: Kazuyoshi Honda , Masaru Odagiri , Kiyoshi Takahashi , Noriyasu Echigo , Nobuki Sunagare
- 申请人： Kazuyoshi Honda , Masaru Odagiri , Kiyoshi Takahashi , Noriyasu Echigo , Nobuki Sunagare
- 申请人地址： JP Kadoma
- 专利权人： Matsushita Electric Industrial Co., Ltd.
- 当前专利权人： Matsushita Electric Industrial Co., Ltd.
- 当前专利权人地址： JP Kadoma
- 代理机构： Renner, Otto, Boisselle & Sklar, LLP
- 优先权： JP8-125400 19960521; JP9-054760 19970310; JP9-062651 19970317; JP9-081768 19970401
- 主分类号： B05B17/04
- IPC分类号： B05B17/04 ; B05D7/24 ; C23C14/24 ; C23C14/56 ; G11B5/85 ; B05D3/06
摘要：
A method for forming a thin film includes the steps of: supplying a deposition material in the form of a liquid onto a heated surface; heating and vaporizing the deposition material on the heated surface while the deposition material is undergoing movement; and depositing the deposition material onto a deposition surface. The deposition material is supplied onto a position of the heated surface where the vaporized deposition material does not reach the deposition surface.
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