Invention Grant
- Patent Title: Apparatus and method for dual spot inspection of repetitive patterns
- Patent Title (中): 重复模式双点检测的装置和方法
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Application No.: US10353754Application Date: 2003-01-28
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Publication No.: US06943898B2Publication Date: 2005-09-13
- Inventor: Alexander Libinson , Haim Feldman , Daniel Some , Boris Goldberg
- Applicant: Alexander Libinson , Haim Feldman , Daniel Some , Boris Goldberg
- Applicant Address: IL Rehovot
- Assignee: Applied Materials Israel, Ltd.
- Current Assignee: Applied Materials Israel, Ltd.
- Current Assignee Address: IL Rehovot
- Agency: Blakely, Sokoloff Taylor & Zafman
- Main IPC: G01N15/14
- IPC: G01N15/14 ; G01N21/956 ; G02B21/14 ; G01B9/02

Abstract:
Apparatus for optical assessment of a sample includes a radiation source, adapted to generate a beam of coherent radiation, and traveling lens optics, adapted to focus the beam so as to generate first and second spots on a surface of the sample and to scan the spots together over the surface. The distance between the first and second spots is responsive to a pitch of a repetitive pattern of the sample. Collection optics are positioned to collect the radiation scattered from the first and second spots and to focus the collected radiation so as to generate an interference pattern. A detector detects a change in the interference pattern.
Public/Granted literature
- US20030210402A1 Apparatus and method for dual spot inspection of repetitive patterns Public/Granted day:2003-11-13
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