发明授权
- 专利标题: Apparatus and method for dual spot inspection of repetitive patterns
- 专利标题(中): 重复模式双点检测的装置和方法
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申请号: US10353754申请日: 2003-01-28
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公开(公告)号: US06943898B2公开(公告)日: 2005-09-13
- 发明人: Alexander Libinson , Haim Feldman , Daniel Some , Boris Goldberg
- 申请人: Alexander Libinson , Haim Feldman , Daniel Some , Boris Goldberg
- 申请人地址: IL Rehovot
- 专利权人: Applied Materials Israel, Ltd.
- 当前专利权人: Applied Materials Israel, Ltd.
- 当前专利权人地址: IL Rehovot
- 代理机构: Blakely, Sokoloff Taylor & Zafman
- 主分类号: G01N15/14
- IPC分类号: G01N15/14 ; G01N21/956 ; G02B21/14 ; G01B9/02
摘要:
Apparatus for optical assessment of a sample includes a radiation source, adapted to generate a beam of coherent radiation, and traveling lens optics, adapted to focus the beam so as to generate first and second spots on a surface of the sample and to scan the spots together over the surface. The distance between the first and second spots is responsive to a pitch of a repetitive pattern of the sample. Collection optics are positioned to collect the radiation scattered from the first and second spots and to focus the collected radiation so as to generate an interference pattern. A detector detects a change in the interference pattern.
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