发明授权
- 专利标题： Ceramic heater system and substrate processing apparatus having the same installed therein
- 专利标题（中）： 陶瓷加热器系统和其中安装有其的基板处理装置
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申请号： US09722485申请日： 2000-11-28
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公开(公告)号： US06951587B1公开(公告)日： 2005-10-04
- 发明人: Masaki Narushima
- 申请人： Masaki Narushima
- 申请人地址： JP Tokyo
- 专利权人： Tokyo Electron Limited
- 当前专利权人： Tokyo Electron Limited
- 当前专利权人地址： JP Tokyo
- 代理机构： Oblon, Spivak, McClelland, Maier & Neustadt, P.C.
- 优先权： JP11-341916 19991201
- 主分类号： H01L21/302
- IPC分类号： H01L21/302 ; C23C16/00 ; C23C16/458 ; C23F1/00 ; H01L21/00 ; H01L21/205 ; H01L21/306 ; H01L21/3065 ; H05B3/20
摘要：
A ceramic heater system has a ceramic heater base having a substrate-mounting surface formed on the top surface thereof and a heater, buried in the heater base, for heating a substrate. A fluid passage is formed buried in the heater base below where the heater is buried. The heater base is cooled as a fluid whose temperature is lower than the temperature of the heater base is let flow in the fluid passage. A substrate processing apparatus has the ceramic heater system installed in a process chamber whose vacuum state can be maintained, a gas supply mechanism for feeding a gas into the process chamber, and a power supply. The substrate processing apparatus performs a heat treatment, etching and film deposition on a substrate placed in the process chamber.