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发明授权
US06956225B1 Method and apparatus for selective pre-dispersion of extracted ion beams in ion implantation systems 失效
在离子注入系统中选择性预分散萃取离子束的方法和装置

Method and apparatus for selective pre-dispersion of extracted ion beams in ion implantation systems
摘要：
Ion implantation systems are provided, comprising a dispersion system located between an ion source and a mass analyzer, that operates to selectively pass an extracted ion beam from the ion source toward the mass analyzer or to direct a dispersed ion beam toward the mass analyzer, where the dispersed ion beam has fewer ions of an undesired mass range than the extracted ion beam.
摘要（中）：

提供离子注入系统，其包括位于离子源和质量分析器之间的分散系统，其操作以选择性地将离子源从离子源向质量分析器传递，或者将分散的离子束引导到质量分析器，其中 分散的离子束具有比提取的离子束更少的不期望质量范围的离子。

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