Invention Grant
- Patent Title: Manufacturing methods for electron source and image forming apparatus
- Patent Title (中): 电子源和图像形成装置的制造方法
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Application No.: US10277921Application Date: 2002-10-23
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Publication No.: US06960111B2Publication Date: 2005-11-01
- Inventor: Tsuyoshi Takegami , Hironobu Mizuno
- Applicant: Tsuyoshi Takegami , Hironobu Mizuno
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Fitzpatrick, Cella, Harper & Scinto
- Priority: JP2001-328995 20011026; JP2002-291916 20021004
- Main IPC: H01J1/316
- IPC: H01J1/316 ; H01J9/02 ; H01J29/04 ; H01J31/12 ; H01J9/00

Abstract:
The present invention provides a method of manufacturing an electron source which exhibits improved uniformity of electron emitting devices and electron emission properties, and a method of manufacturing an image forming apparatus which exhibits an excellent display quality for a long time. An electron source having a plurality of electron emitting devices is manufactured by disposing a plurality of units, each comprising a pair of electrodes and a polymer film for connecting the electrodes, on a substrate, disposing a plurality of wirings for connection to the pair of electrodes of the plurality of each unit, and decreasing the resistances of all polymer films respectively of the units. A next step includes applying a voltage to films formed by decreasing the resistances of the polymer films, through the wirings, to form a gap in each of the films formed by decreasing the resistance of the polymer films.
Public/Granted literature
- US20030082981A1 Manufacturing methods for electron source and image forming apparatus Public/Granted day:2003-05-01
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