发明授权
- 专利标题: Methods for manufacturing a light-emitting device
- 专利标题(中): 制造发光装置的方法
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申请号: US09711908申请日: 2000-11-15
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公开(公告)号: US06962828B1公开(公告)日: 2005-11-08
- 发明人: Norikatsu Koide , Masayoshi Koike , Shiro Yamasaki , Isamu Akasaki , Hiroshi Amano
- 申请人: Norikatsu Koide , Masayoshi Koike , Shiro Yamasaki , Isamu Akasaki , Hiroshi Amano
- 申请人地址: JP Aichi JP Nagoya JP Nagoya
- 专利权人: Toyoda Gosei Co., Ltd.,Isamu Akasaki,Hiroshi Amano
- 当前专利权人: Toyoda Gosei Co., Ltd.,Isamu Akasaki,Hiroshi Amano
- 当前专利权人地址: JP Aichi JP Nagoya JP Nagoya
- 代理机构: McGinn & Gibb, PLLC
- 优先权: JP8-257818 19960908
- 主分类号: H01L21/86
- IPC分类号: H01L21/86 ; H01L33/32 ; H01S5/00 ; H01S5/02 ; H01S5/323 ; H01L21/00
摘要:
A novel light-emitting device includes a saphire substrate with a light-emitting layer comprising InXGa1−XN, where the critical value of the indium mole fraction X is determined by a newly derived relationship between the indium mole fraction X and the wavelength λ of emitted light.
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