发明授权
- 专利标题: Method for manufacturing thin semiconductor chip
- 专利标题(中): 薄半导体芯片制造方法
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申请号: US10496690申请日: 2003-08-28
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公开(公告)号: US06974721B2公开(公告)日: 2005-12-13
- 发明人: Naoyuki Koizumi , Kei Murayama , Shigeru Mizuno , Takashi Kurihara
- 申请人: Naoyuki Koizumi , Kei Murayama , Shigeru Mizuno , Takashi Kurihara
- 申请人地址: JP Nagano
- 专利权人: Shinko Electric Industries Co., Ltd.
- 当前专利权人: Shinko Electric Industries Co., Ltd.
- 当前专利权人地址: JP Nagano
- 代理机构: Staas & Halsey LLP
- 优先权: JP2002-281659 20020926
- 国际申请: PCT/JP03/10954 WO 20030828
- 国际公布: WO2004/030053 WO 20040408
- 主分类号: H01L21/301
- IPC分类号: H01L21/301 ; H01L21/00 ; H01L21/02 ; H01L21/68 ; H01L21/78 ; H01L21/44 ; H01L21/48 ; H01L21/50
摘要:
In manufacturing a thin semiconductor chip, a wafer is stably held during processing to maintain a stable shape and to avoid generation of cracks on the wafer. When a thin wafer having a surface thereon is to be processed, a rigid support body is adhered to the other surface of the thin wafer and a ring-shaped frame, encircling an outer periphery of the thin wafer, is adhered to the rigid support body.
公开/授权文献
- US20050176169A1 Thin semiconductor chip manufacturing method 公开/授权日:2005-08-11
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