发明授权
- 专利标题: Review work supporting system
- 专利标题(中): 审查工作支持系统
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申请号: US10096917申请日: 2002-03-14
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公开(公告)号: US06978041B2公开(公告)日: 2005-12-20
- 发明人: Seiji Isogai , Hitoshi Komuro , Hideo Wada , Katsuharu Shoda
- 申请人: Seiji Isogai , Hitoshi Komuro , Hideo Wada , Katsuharu Shoda
- 申请人地址: JP Tokyo
- 专利权人: Hitachi, Ltd.
- 当前专利权人: Hitachi, Ltd.
- 当前专利权人地址: JP Tokyo
- 代理机构: Dickstein Shapiro Morin & Oshinsky LLP
- 优先权: JP2001-191519 20010625
- 主分类号: G01N21/956
- IPC分类号: G01N21/956 ; G01N23/225 ; G03F1/00 ; G03F7/20 ; G06T1/00 ; G06T7/00 ; H01L21/66 ; G06K9/00
摘要:
An object of the present invention is to increase efficiency in review work by appropriately narrowing down review work that verifies shapes of visual defects relating to an enormous amount of defects detected by a visual inspecting apparatus with high sensitivity. In order to appropriately extract defect information from an inspecting apparatus, a filter function and a sampling function are prepared by unitizing the functions. As a result, defects as review targets are narrowed down and extracted automatically using the filter function and the sampling function in combination. In addition, sequencing the filter conditions and the sampling conditions and registering the sequence enables automatic filtering and sampling on the basis of information on a wafer as a review target, and thereby only defect information on the review target is extracted.
公开/授权文献
- US20020196968A1 Review work supporting system 公开/授权日:2002-12-26
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