Invention Grant
- Patent Title: Conductive polishing article for electrochemical mechanical polishing
- Patent Title (中): 电化学机械抛光用导电抛光制品
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Application No.: US10140010Application Date: 2002-05-07
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Publication No.: US06979248B2Publication Date: 2005-12-27
- Inventor: Yongqi Hu , Yan Wang , Alain Duboust , Feng Q. Liu , Rashid Mavliev , Liang-Yuh Chen , Ratson Morad , Sasson Somekh
- Applicant: Yongqi Hu , Yan Wang , Alain Duboust , Feng Q. Liu , Rashid Mavliev , Liang-Yuh Chen , Ratson Morad , Sasson Somekh
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Patterson & Sheridan
- Main IPC: C25D7/12
- IPC: C25D7/12 ; B23H5/08 ; B24B37/04 ; B24D13/14 ; C25F3/00 ; C25F3/30 ; C25F7/00 ; H01L21/304 ; B24B1/00 ; C25C7/04 ; C25D17/00

Abstract:
An article of manufacture, method, and apparatus are provided for planarizing a substrate surface. In one aspect, an article of manufacture is provided for polishing a substrate including a polishing article having a body comprising at least a portion of fibers coated with a conductive material, conductive fillers, or combinations thereof, and adapted to polish the substrate. In another aspect, a polishing article includes a body having a surface adapted to polish the substrate and at least one conductive element embedded in the polishing surface, the conductive element comprising dielectric or conductive fibers coated with a conductive material, conductive fillers, or combinations thereof. The conductive element may have a contact surface that extends beyond a plane defined by the polishing surface. A plurality of perforations and a plurality of grooves may be formed in the articles to facilitate flow of material through and around the polishing article.
Public/Granted literature
- US20030209448A1 Conductive polishing article for electrochemical mechanical polishing Public/Granted day:2003-11-13
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