发明授权
US06986261B2 Method and system for controlling chiller and semiconductor processing system
有权
控制冷水机组和半导体加工系统的方法和系统
- 专利标题: Method and system for controlling chiller and semiconductor processing system
- 专利标题(中): 控制冷水机组和半导体加工系统的方法和系统
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申请号: US10712043申请日: 2003-11-14
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公开(公告)号: US06986261B2公开(公告)日: 2006-01-17
- 发明人: Norikazu Sasaki , Hiroshi Koizumi , Norihiko Amikura
- 申请人: Norikazu Sasaki , Hiroshi Koizumi , Norihiko Amikura
- 申请人地址: JP Tokyo
- 专利权人: Tokyo Electron Limited
- 当前专利权人: Tokyo Electron Limited
- 当前专利权人地址: JP Tokyo
- 代理机构: Oblon, Spivak, McClelland, Maier & Neustadt, P.C.
- 优先权: JP2002-332800 20021115; JP2003-076103 20030319; JP2003-076104 20030319; JP2003-076105 20030319
- 主分类号: F25D17/02
- IPC分类号: F25D17/02
摘要:
A semiconductor processing system includes a control section that refers to recipe information on a process sequence, thereby detects that a processing apparatus will shift from an ordinary operation state to a long idle state, and switches thermo-medium circulation apparatus from an ordinary mode to an energy-saving mode after the shift to the long idle state. The control section refers to recipe information on the process sequence or another process sequence, thereby detects that the processing apparatus will shift from the long idle state to the ordinary operation state, and switches the thermo-medium circulation apparatus from the energy-saving mode to the ordinary mode before the shift to the ordinary operation state. A thermo-medium is circulated at a first flow rate and at a second flow rate smaller than the first flow rate in the ordinary mode and the energy-saving mode, respectively.
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