发明授权
US06989706B2 Method for application of gating signal in insulated double gate FET
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绝缘双栅FET中门控信号的应用方法
- 专利标题: Method for application of gating signal in insulated double gate FET
- 专利标题(中): 绝缘双栅FET中门控信号的应用方法
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申请号: US10808432申请日: 2004-03-25
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公开(公告)号: US06989706B2公开(公告)日: 2006-01-24
- 发明人: Toshihiro Sekigawa , Hanpei Koike , Tadashi Nakagawa
- 申请人: Toshihiro Sekigawa , Hanpei Koike , Tadashi Nakagawa
- 申请人地址: JP Tokyo
- 专利权人: National Institute of Advanced Industrial Science and Technology
- 当前专利权人: National Institute of Advanced Industrial Science and Technology
- 当前专利权人地址: JP Tokyo
- 代理机构: Oblon, Spivak, McClelland, Maier & Neustadt, P.C.
- 优先权: JP2003-087386 20030327
- 主分类号: H03K17/687
- IPC分类号: H03K17/687
摘要:
In an insulated double gate FET, the threshold voltage during the operation of a transient response thereof is enabled to be arbitrarily and accurately controlled by a method that includes applying a first input signal intended to perform an ordinary logic operation to one of the gate electrodes thereof and applying, in response to this signal, a second signal that has a signal-level temporal-change direction as the first input signal and has at least one of the low level and the high level thereof shifted by a predetermined magnitude or endowed with a predetermined time difference or has the time slower or faster signal level change of the signal to the other gate electrode.
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