发明授权
- 专利标题: Substrate processing apparatus and method of processing substrate while controlling for contamination in substrate transfer module
- 专利标题(中): 基板处理装置和处理基板的方法,同时控制基板传送模块中的污染
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申请号: US10684436申请日: 2003-10-15
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公开(公告)号: US06996453B2公开(公告)日: 2006-02-07
- 发明人: Yo-Han Ahn , Ki-Doo Kim , Soo-Woong Lee , Jung-Sung Hwang , Hyeog-Ki Kim
- 申请人: Yo-Han Ahn , Ki-Doo Kim , Soo-Woong Lee , Jung-Sung Hwang , Hyeog-Ki Kim
- 申请人地址: KR Suwon-si
- 专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人地址: KR Suwon-si
- 代理机构: Volentine Francos & Whitt PLLC
- 优先权: KR10-2002-0075458 20021129
- 主分类号: G06F7/00
- IPC分类号: G06F7/00
摘要:
A substrate processing apparatus for processing substrates prevents the substrates from contaminating as they are transferred. The apparatus includes a container, like a FOUP, for containing substrates, at least one processing chamber where the substrates are processed, a substrate transferring module including a substrate transfer chamber and at least one load port for supporting a container, and a contamination controlling system for the substrate transfer chamber. The contamination controlling system includes a purge gas supply inlet connected to the substrate transfer chamber, and a gas circulating tube for recycling the purging gas to circulate through the chamber. The substrate transfer chamber is purged using the purging gas to remove moisture and contaminating materials from the substrate transfer chamber. The formation of particles on the substrate otherwise caused by a reaction between the moisture and contaminating materials while the substrate is standing by in the container can be prevented.
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