公开(公告)号：US07438514B2

公开(公告)日：2008-10-21

申请号：US10963541

申请日：2004-10-14

申请人： Soo-woong Lee ,  Hyung-seok Choi ,  Jung-sung Hwang ,  Sung-hwan Choi

发明人： Soo-woong Lee ,  Hyung-seok Choi ,  Jung-sung Hwang ,  Sung-hwan Choi

IPC分类号： B65G49/07

CPC分类号： H01L21/67017 ,  H01L21/67772

摘要： A wafer transfer system, and method of controlling pressure in the system, includes a loadport for receiving a wafer container, a housing operably connected to the loadport, a wafer transfer mechanism for transferring a wafer between the wafer container and the housing, a wafer container sensor for detecting a presence of the wafer container on the loadport, a variable speed fan disposed in a first portion of the housing, a variable exhaust unit disposed in a second portion of the housing facing the first portion, the variable exhaust unit being capable of varying an exhaust rate of air from the housing, and a controller for variably operating the variable speed fan and the variable exhaust unit in response to a signal from the wafer container sensor.

摘要翻译： 晶片传送系统和系统中的压力控制方法包括用于接收晶片容器的容纳端口，可操作地连接到负载端口的壳体，用于在晶片容器和壳体之间传送晶片的晶片传送机构，晶片容器 传感器，用于检测装载口上的晶片容器的存在，设置在壳体的第一部分中的变速风扇，设置在面向第一部分的壳体的第二部分中的可变排气单元，该可变排气单元能够 改变来自壳体的空气排出率，以及控制器，用于响应于来自晶片容器传感器的信号，可变地操作变速风扇和可变排气单元。

公开(公告)号：US07161660B2

公开(公告)日：2007-01-09

申请号：US11017783

申请日：2004-12-22

申请人： Yo-Han Ahn ,  Seok-Ryeul Lee ,  Jung-Sung Hwang ,  Tae-Jin Hwang ,  Byung-Moo Lee

发明人： Yo-Han Ahn ,  Seok-Ryeul Lee ,  Jung-Sung Hwang ,  Tae-Jin Hwang ,  Byung-Moo Lee

IPC分类号： G03B27/72

CPC分类号： G03F7/70558

摘要： A management system and method of a reticle in an exposing process are disclosed. A calculator calculates an accumulated dosage of an illuminating light irradiated onto a reticle used in a photolithography process. The calculator is connected to an exposing apparatus to expose photoresist on a semiconductor substrate. A comparator compares the calculated accumulated dosage with a preset reference dosage. When the calculated accumulated dosage is greater than or equal to the reference dosage, a controller suspends the photolithography process. Minimizing haze contamination on the reticle, thus preventing process failures.

摘要翻译： 公开了一种在曝光过程中的掩模版的管理系统和方法。 计算器计算照射到光刻工艺中使用的掩模版上的照射光的累积剂量。 计算器连接到曝光装置以暴露半导体衬底上的光致抗蚀剂。 比较器将计算的累积剂量与预设的参考剂量进行比较。 当计算的累积剂量大于或等于参考剂量时，控制器暂停光刻工艺。 最小化掩模版上的雾度污染，从而防止过程故障。

公开(公告)号：US20060018736A1

公开(公告)日：2006-01-26

申请号：US10963541

申请日：2004-10-14

申请人： Soo-woong Lee ,  Hyung-seok Choi ,  Jung-sung Hwang ,  Sung-hwan Choi

发明人： Soo-woong Lee ,  Hyung-seok Choi ,  Jung-sung Hwang ,  Sung-hwan Choi

IPC分类号： H01L21/677

CPC分类号： H01L21/67017 ,  H01L21/67772

摘要： A wafer transfer system, and method of controlling pressure in the system, includes a loadport for receiving a wafer container, a housing operably connected to the loadport, a wafer transfer mechanism for transferring a wafer between the wafer container and the housing, a wafer container sensor for detecting a presence of the wafer container on the loadport, a variable speed fan disposed in a first portion of the housing, a variable exhaust unit disposed in a second portion of the housing facing the first portion, the variable exhaust unit being capable of varying an exhaust rate of air from the housing, and a controller for variably operating the variable speed fan and the variable exhaust unit in response to a signal from the wafer container sensor.

摘要翻译： 晶片传送系统和系统中的压力控制方法包括用于接收晶片容器的容纳端口，可操作地连接到负载端口的壳体，用于在晶片容器和壳体之间传送晶片的晶片传送机构，晶片容器 传感器，用于检测装载口上的晶片容器的存在，设置在壳体的第一部分中的变速风扇，设置在面向第一部分的壳体的第二部分中的可变排气单元，该可变排气单元能够 改变来自壳体的空气排出率，以及控制器，用于响应于来自晶片容器传感器的信号，可变地操作变速风扇和可变排气单元。

公开(公告)号：US06176120B1

公开(公告)日：2001-01-23

申请号：US09330972

申请日：1999-06-11

申请人： Nam-hee You ,  Dong-soo Lee ,  Sun-young Lee ,  Jung-sung Hwang

发明人： Nam-hee You ,  Dong-soo Lee ,  Sun-young Lee ,  Jung-sung Hwang

IPC分类号： G01N1100

CPC分类号： G01N1/2202 ,  G01N1/24 ,  G01N2001/2223 ,  G01N2001/2282 ,  G01N2001/4066

摘要： Methods of analyzing water-soluble contaminants comprise providing reference air streams having gaseous water present therein; condensing the reference air streams such that the gaseous water liquefies; pressurizing the liquefied water; and supplying the liquefied water to analyzers. Systems for analyzing water-soluble contaminants comprise air inlets that absorb reference air containing gaseous water therein; valves that control the flow of the reference air in fluid communication with the air inlets; condensers that condense the gaseous water in the reference air in fluid communication with the valves; pressurization pumps that pressurize the water condensed from the reference air in fluid communication with the condensers; and discharge pumps that discharge an excessive amount of water contained in the reference air.

摘要翻译： 分析水溶性污染物的方法包括提供其中存在气态水的参考空气流; 冷凝参考气流，使气态水液化; 对液化水加压; 并将液化水供应给分析仪。 用于分析水溶性污染物的系统包括吸收其中含有气态水的参考空气的空气入口; 控制与空气入口流体连通的参考空气的流动的阀; 冷凝器，其将与参考空气中的气态水冷凝成与阀流体连通; 加压泵，其将与从冷凝器流体连通的参考空气冷凝的水加压; 以及排出包含在参考空气中的过量水的排出泵。

公开(公告)号：US5871812A

公开(公告)日：1999-02-16

申请号：US773879

申请日：1996-12-26

申请人： Jung-Sung Hwang ,  Dong-Joo Lee ,  Nam-Hee You ,  Sang-Young Moon

发明人： Jung-Sung Hwang ,  Dong-Joo Lee ,  Nam-Hee You ,  Sang-Young Moon

IPC分类号： G01N21/88 ,  C23C16/44 ,  C23C16/448 ,  C23C16/455 ,  C30B31/06 ,  C30B33/00 ,  G01N21/94 ,  G01N21/956 ,  H01L21/02 ,  H01L21/20 ,  C23C16/00

CPC分类号： C23C16/45565 ,  C23C16/4401 ,  C23C16/448 ,  C23C16/45512 ,  C30B31/06 ,  C30B33/00

摘要： An apparatus for quantitatively depositing molecular impurities on a semiconductor wafer, includes a reaction chamber, a gas generator for generating a source gas serving as the molecular impurities, a humidifier for generating moisture vapour of a constant temperature, a mixer for mixing the source gas and the moisture vapour to generate a mixed gas, a gas injector for injecting the mixed gas into the reaction chamber, an exhausting part for initiating a vacuum condition in the reaction chamber before deposition of the molecular impurities and for exhausting a remaining gases after deposition of the molecular impurities, and a cleaning air supply portion for supplying a cleaning air into the reaction chamber before deposition of the molecular impurities. After fabricating a semiconductor device using the wafer processed as above, a defective source of mechanism of contamination can be traced by analysing the semiconductor device.

摘要翻译： 一种用于在半导体晶片上定量沉积分子杂质的装置包括反应室，用于产生用作分子杂质的源气体的气体发生器，用于产生恒温的湿气的加湿器，用于混合源气体的混合器和 产生混合气体的水分蒸汽，将混合气体注入反应室的气体注入器，用于在沉积分子杂质之前在反应室中引发真空状态并在沉积之后排出剩余气体的排气部分 分子杂质和用于在沉积分子杂质之前将清洁空气供应到反应室中的清洁空气供应部分。 在使用如上所述处理的晶片制造半导体器件之后，可以通过分析半导体器件来追踪污染机制的有缺陷的源。

公开(公告)号：US07156892B2

公开(公告)日：2007-01-02

申请号：US10684409

申请日：2003-10-15

申请人： Dae-Won Kim ,  Jung-Sung Hwang ,  Tae-Hyup Kim

发明人： Dae-Won Kim ,  Jung-Sung Hwang ,  Tae-Hyup Kim

IPC分类号： B01D46/10

CPC分类号： B01D46/0002 ,  Y10S55/29 ,  Y10S55/31 ,  Y10S55/35

摘要： A filter protection apparatus includes a frame of a closed curve defining an inner space isolated from surroundings, the frame having a shape of a filter securing part for securing an air filter, an attaching part for attaching the frame to a filter securing part, and a protection part, which is coupled on the inner surface of the frame to occupy the inner space with a plurality of minute holes through which air passes, for protecting the filter from damage. In operation, the protection part is able to prevent damage to the filter that may be caused by work instruments during maintenance work.

摘要翻译： 过滤器保护装置包括限定与周围隔离的内部空间的闭合曲线的框架，框架具有用于固定空气过滤器的过滤器固定部分的形状，用于将框架附接到过滤器固定部分的附接部分，以及 保护部件，其联接在框架的内表面上，以利用空气通过的多个微小孔来占据内部空间，以保护过滤器免受损坏。 在操作中，保护部件能够防止在维护工作期间由工作仪器引起的过滤器损坏。

公开(公告)号：US06996453B2

公开(公告)日：2006-02-07

申请号：US10684436

申请日：2003-10-15

申请人： Yo-Han Ahn ,  Ki-Doo Kim ,  Soo-Woong Lee ,  Jung-Sung Hwang ,  Hyeog-Ki Kim

发明人： Yo-Han Ahn ,  Ki-Doo Kim ,  Soo-Woong Lee ,  Jung-Sung Hwang ,  Hyeog-Ki Kim

IPC分类号： G06F7/00

CPC分类号： H01L21/00 ,  H01L21/67017 ,  Y10S414/139

摘要： A substrate processing apparatus for processing substrates prevents the substrates from contaminating as they are transferred. The apparatus includes a container, like a FOUP, for containing substrates, at least one processing chamber where the substrates are processed, a substrate transferring module including a substrate transfer chamber and at least one load port for supporting a container, and a contamination controlling system for the substrate transfer chamber. The contamination controlling system includes a purge gas supply inlet connected to the substrate transfer chamber, and a gas circulating tube for recycling the purging gas to circulate through the chamber. The substrate transfer chamber is purged using the purging gas to remove moisture and contaminating materials from the substrate transfer chamber. The formation of particles on the substrate otherwise caused by a reaction between the moisture and contaminating materials while the substrate is standing by in the container can be prevented.

摘要翻译： 用于处理基板的基板处理装置防止基板在被转印时被污染。 该装置包括用于容纳衬底的容器，如FOUP，用于处理衬底的至少一个处理室，包括衬底传送室的衬底传送模块和用于支撑容器的至少一个负载端口，以及污染控制系统 用于衬底传送室。 污染控制系统包括连接到基板传送室的吹扫气体供给入口和用于使净化气体循环通过室的气体循环管。 使用净化气体清洗基板传送室，以从基板传送室去除水分和污染材料。 可以防止在衬底上的颗粒在容器中待机时由水分和污染物质之间的反应引起的颗粒的形成。

公开(公告)号：US20060021934A1

公开(公告)日：2006-02-02

申请号：US11089456

申请日：2005-03-22

申请人： Chang-Min Cho ,  Jung-Sung Hwang ,  Dong-Seok Ham ,  Ha-Na Kim

发明人： Chang-Min Cho ,  Jung-Sung Hwang ,  Dong-Seok Ham ,  Ha-Na Kim

IPC分类号： B01D29/07

CPC分类号： B01D39/083 ,  B01D39/086 ,  B01D39/12 ,  B01D2239/0407 ,  B01D2239/0478 ,  B01D2239/083 ,  B01J20/3223 ,  Y10T156/10

摘要： The invention discloses a method and system for fabricating a filter structure. The method for fabricating the filter structure comprises preparing a filtering net having mesh patterns, injecting an adhesive on the filtering net, and adhering refining materials to the filtering net coated with the adhesive. Here, the adhesive is injected to have a smaller size than an interval of the mesh patterns. The system for fabricating the filter structure comprises a filtering net, a filtering net transfer device for transferring the filtering net, and an adhesive injection device for injecting an adhesive solution on the filtering net.

摘要翻译： 本发明公开了一种制造过滤器结构的方法和系统。 制造过滤器结构的方法包括制备具有网眼图案的过滤网，在过滤网上注入粘合剂，以及将精炼材料粘附到涂覆有粘合剂的过滤网上。 这里，粘合剂被注入以具有比网状图案的间隔更小的尺寸。 用于制造过滤器结构的系统包括过滤网，用于转移过滤网的过滤网转移装置和用于在过滤网上注入粘合剂溶液的粘合剂注入装置。

公开(公告)号：US6098023A

公开(公告)日：2000-08-01

申请号：US959858

申请日：1997-10-29

申请人： Jung-sung Hwang ,  Jae-heung Choi ,  Yo-han Ahn ,  Dong-joo Lee

发明人： Jung-sung Hwang ,  Jae-heung Choi ,  Yo-han Ahn ,  Dong-joo Lee

IPC分类号： F24F7/06 ,  B01D46/46 ,  F24F3/16 ,  G05B23/02 ,  G06F11/32 ,  H01H1/02 ,  H01L21/02 ,  G06F11/30 ,  G05B11/00

CPC分类号： H01H1/0201 ,  F24F3/161 ,  G05B23/027 ,  G05B23/0272 ,  G06F11/326 ,  F24F2011/0093

摘要： A monitoring device and a driving control system for a fan filter unit in a semiconductor clean room for monitoring the operating state of the fan filter unit. The monitoring device includes a switching section in each fan filter unit which alternately applies electrical power to one of a plurality of terminals. The switching section is responsive to a force from an air stream introduced therein via rotation of a fan in the fan filter unit. A display section in each fan filter unit is connected to the plurality of terminals which provide different signals, indicative of an on or off state of the fan, according to which of the plurality of terminals is electrically connected to the electrical power.

摘要翻译： 一种用于半导体洁净室中的风扇过滤器单元的监视装置和驱动控制系统，用于监视风扇过滤器单元的运行状态。 监视装置包括在每个风扇过滤器单元中的切换部分，其交替地向多个终端中的一个终端提供电力。 切换部分通过风扇过滤器单元中的风扇的旋转响应于从其中引入的气流的力。 每个风扇滤波器单元中的显示部分连接到多个端子，所述多个端子提供指示风扇的开启或关闭状态的不同信号，根据多个端子中的哪一个电连接到电力。

公开(公告)号：US6093229A

公开(公告)日：2000-07-25

申请号：US172152

申请日：1998-10-14

申请人： Kun-hyung Lee ,  Jung-sung Hwang ,  Yo-han Ahn ,  Jae-heung Choi

发明人： Kun-hyung Lee ,  Jung-sung Hwang ,  Yo-han Ahn ,  Jae-heung Choi

IPC分类号： F24F7/06 ,  B01D46/00 ,  B01D46/44 ,  F24F11/00 ,  F24F11/02 ,  B01D35/143

CPC分类号： B01D46/0086 ,  B01D46/444 ,  B01D2273/18 ,  B01D2273/30 ,  B01D2279/51 ,  Y10S55/34

摘要： A fan drive checking system, for an air conditioning system in a clean room having a fan filter unit (FFU), includes a flow sensor for sensing air flow inside a housing of a FFU. The sensor provides a sensor signal indicative of normal and adverse flow conditions in the housing. A control portion in data communication with the sensor outputs a control signal responsive to the sensing signal. An alarm in data communication with the control portion provides a warning when the control signal indicates the adverse flow condition.

摘要翻译： 在具有风扇过滤器单元（FFU）的洁净室中的空调系统的风扇驱动器检查系统包括用于感测FFU的壳体内的空气流的流量传感器。 传感器提供表示壳体中正常和不利流动条件的传感器信号。 与传感器进行数据通信的控制部分响应于感测信号输出控制信号。 当控制信号指示不利流动状况时，与控制部分的数据通信中的警报提供警告。