- 专利标题： Particle measurement configuration and semiconductor wafer processing device with such a configuration
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申请号： US10233878申请日： 2002-09-03
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公开(公告)号： US07000454B2公开(公告)日： 2006-02-21
- 发明人: Claus Schneider , Ralph Trunk , Lothar Pfitzner , Heinz Schmid
- 申请人： Claus Schneider , Ralph Trunk , Lothar Pfitzner , Heinz Schmid
- 申请人地址： DE Munich DE Munich
- 专利权人： Infineon Technologies AG,Fraunhofer-Gesellschaft zur Foerderung der Angewandten Forschung E.V.
- 当前专利权人： Infineon Technologies AG,Fraunhofer-Gesellschaft zur Foerderung der Angewandten Forschung E.V.
- 当前专利权人地址： DE Munich DE Munich
- 代理商 Laurence A. Greenberg; Werner H. Stemer; Ralph E. Locher
- 优先权： DE10143075 20010903
- 主分类号： G01N19/00
- IPC分类号： G01N19/00
摘要：
A particle measurement configuration measures the particle concentration in a liquid or gaseous medium by way of a particle measuring instrument. In order to avoid erroneous measurements or damage to the particle measuring instrument, a measuring cell is provided which measures temperature or pressure or pH of the medium. A system controller shuts off a valve if threshold values are exceeded and it prevents the particle measuring instrument from being operated outside a predefined specification.
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