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    Apparatus and measurement procedure for the fast, quantitative, non-contact topographic investigation of semiconductor wafers and other mirror like surfaces
    2.
    发明授权
    Apparatus and measurement procedure for the fast, quantitative, non-contact topographic investigation of semiconductor wafers and other mirror like surfaces 有权
    用于半导体晶片和其他镜像表面的快速，定量，非接触地形研究的装置和测量程序

    公开(公告)号：US07133140B2

    公开(公告)日：2006-11-07

    申请号：US10814252

    申请日：2004-04-01

    申请人： István Endre Lukács ,  János Makai ,  Lothar Pfitzner ,  Ferenc Riesz ,  Béla Szentpali

    发明人： István Endre Lukács ,  János Makai ,  Lothar Pfitzner ,  Ferenc Riesz ,  Béla Szentpali

    IPC分类号： G01B11/24

    CPC分类号： G01B11/303 ,  G01N21/9501

    摘要： Apparatus and process for fast, quantitative, non-contact topographic investigation of samples. Apparatus includes a light source, and a collimating concave mirror structured and arranged to produce a parallel beam and to direct the parallel beam to a sample to be investigated. A structured mask is located between the light source and the concave mirror, and an image sensor structured and arranged to receive a beam reflected from the sample and the concave mirror. Relative positions of the mask and the sensor to other elements of the apparatus are chosen to provide an essentially sharp image of the mask on the sensor. The instant abstract is neither intended to define the invention disclosed in this specification nor intended to limit the scope of the invention in any way.

    摘要翻译： 用于样品快速，定量，非接触地形调查的仪器和过程。 装置包括光源和被构造和布置成产生平行光束并将平行光束引导到待研究样品的准直凹面镜。 结构化掩模位于光源和凹面镜之间，以及图像传感器，其构造和布置成接收从样品和凹面反射镜反射的光束。 选择掩模和传感器与设备的其它元件的相对位置以在传感器上提供掩模的基本上清晰的图像。 本摘要既不旨在限定本说明书中公开的发明，也不旨在以任何方式限制本发明的范围。

    Apparatus for rapidly measuring angle-dependent diffraction effects on finely patterned surfaces
    3.
    发明授权
    Apparatus for rapidly measuring angle-dependent diffraction effects on finely patterned surfaces 有权
    用于在精细图案化表面上快速测量与角度相关的衍射效应的装置

    公开(公告)号：US06724475B2

    公开(公告)日：2004-04-20

    申请号：US09968587

    申请日：2001-10-01

    申请人： Norbert Benesch ,  Claus Schneider ,  Lothar Pfitzner

    发明人： Norbert Benesch ,  Claus Schneider ,  Lothar Pfitzner

    IPC分类号： G01N2100

    CPC分类号： G01B11/30 ,  G01N21/4788

    摘要： An apparatus for measuring angle-dependent diffraction effects includes a coherent radiation source, a device for deflecting the coherent radiation in different directions, a spherical or aspherical mirror or mirror segments configured to correspond to a spherical or aspherical mirror, and a detector unit for measuring the intensity of the radiation diffracted at a specimen. The radiation deflected in different directions is reflected by the mirror configuration in such a way that the coherent beam is deflected onto the specimen with different angles of incidence in a temporally successively sequential manner. For this purpose, the angle of incidence of the measuring beam is altered continuously or in small steps. The intensities of the direct reflection (zero-order diffraction) and also of the higher orders of diffraction that may occur are measured. This evaluation allows conclusions to be drawn regarding the form and material of the periodic structures examined.

    摘要翻译： 用于测量依赖于角度的衍射效应的装置包括相干辐射源，用于偏转不同方向的相干辐射的装置，被配置为对应于球面或非球面镜的球面镜或非球面镜或镜片，以及用于测量的检测器单元 在试样处辐射的辐射强度。 以不同方向偏转的辐射由反射镜构造反射，使得相干光束以时间上依次顺序的方式以不同的入射角偏转到样本上。 为此，测量光束的入射角度连续地或以小的步长改变。 测量直接反射（零级衍射）的强度以及可能发生的较高的衍射级数。 该评估允许对所检查的周期性结构的形式和材料得出结论。

    Quality surveillance of a production process
    4.
    发明授权
    Quality surveillance of a production process 失效
    生产过程的质量监督

    公开(公告)号：US06622101B1

    公开(公告)日：2003-09-16

    申请号：US09868922

    申请日：2002-01-22

    申请人： Richard Oechsner ,  Thomas Tschaftary ,  Poitr Strzyzewski ,  Lothar Pfitzner ,  Claus Schneider ,  Peter Hennig

    发明人： Richard Oechsner ,  Thomas Tschaftary ,  Poitr Strzyzewski ,  Lothar Pfitzner ,  Claus Schneider ,  Peter Hennig

    IPC分类号： G06F1900

    CPC分类号： G07C3/14 ,  Y02P90/22

    摘要： Method for monitoring a quality of a plurality of particularly different technical product types which are produced in a quasi-parallel manufacturing process, the manufacturing method including several sequentially arranged manufacturing stations, and whereby a course of a state variable for at least one of the manufacturing stations is determined point-by-point and displayed, the method including determining as a first type number a number of product types to be monitored, determining technical product parameter which is affected in the at least one manufacturing station, allocating a measuring arrangement to the manufacturing station for measuring the technical product parameter for at least one of the monitored product types, taking a random sample of a product type whose physical state is modified in the manufacturing station, the random sample being taken the first type number of product types, determining measured values for the determined technical product parameter of the random sample, calculating an individual average value from the measured values, storing the individual average value in a multi-dimensional average value attributed to the first type number, and repeating the taking through the storing for at least one further product type to supplement at least one further measured average value to the multi-dimensional average value.

    摘要翻译： 用于监测在准并行制造过程中生产的多种特别不同的技术产品类型的质量的方法，所述制造方法包括几个顺序排列的制造站，并且由此产生用于至少一个制造的状态变量的过程 站点逐点确定并显示，该方法包括确定作为第一类型号码的待监视的产品类型的数量，确定在至少一个制造站中受影响的技术产品参数，将测量装置分配给 制造站，用于测量所监测产品类型中的至少一个的技术产品参数，采用在制造工厂中物理状态被修改的产品类型的随机样本，随机样品取第一类型数量的产品类型，确定 rando的确定的技术产品参数的测量值 m样本，从测量值计算个体平均值，将个体平均值存储在归因于第一类型数量的多维平均值中，并且重复进行至少一种其他产品类型的存储以补充至少 另一个测量的平均值与多维平均值。

    Configuration for determining a concentration of contaminating particles in a loading and unloading chamber of an appliance for processing at least one disk-like object
    5.
    发明授权
    Configuration for determining a concentration of contaminating particles in a loading and unloading chamber of an appliance for processing at least one disk-like object 失效
    用于确定用于处理至少一个盘状物体的器具的装载和卸载室中的污染颗粒浓度的配置

    公开(公告)号：US06928892B2

    公开(公告)日：2005-08-16

    申请号：US10233901

    申请日：2002-09-03

    申请人： Olaf Storbeck ,  Ralph Trunk ,  Lothar Pfitzner ,  Claus Schneider

    发明人： Olaf Storbeck ,  Ralph Trunk ,  Lothar Pfitzner ,  Claus Schneider

    IPC分类号： G01N15/06

    CPC分类号： G01N15/06

    摘要： A configuration for measuring the concentration of contaminating particles at high time resolution in the mini environments of loading and unloading chambers of processing appliances in semiconductor fabrication includes a probe, a movement unit for the probe, a particle detector, vacuum pump and a control unit. Reaching critical layer thicknesses of disk carriers or boats in ovens, and maladjustments of handling systems for wafers, masks, flat panel displays and other disc-like objects can be detected in terms of the cause and quantified immediately. The movement unit moves the probe to a desired position in the loading and unloading chamber as a reaction to the positioning of the handling system. A method of operating the configuration is also provided.

    摘要翻译： 用于在半导体制造中的加工装置的装卸室的微型环境中以高时间分辨率测量污染粒子的浓度的结构包括探针，用于探针的移动单元，粒子检测器，真空泵和控制单元。 达到在烤箱中的盘式载体或船的关键层厚度，以及对于晶片，掩模，平板显示器和其它盘状物体的处理系统的调整可以根据原因被检测并立即量化。 移动单元将探针移动到装载和卸载室中的期望位置，作为对处理系统的定位的反应。 还提供了一种操作该配置的方法。