Invention Grant
US07002667B2 Lithographic apparatus with alignment subsystem, device manufacturing method, and device manufactured thereby
有权
具有对准子系统的光刻设备，器件制造方法以及由此制造的器件
- Patent Title: Lithographic apparatus with alignment subsystem, device manufacturing method, and device manufactured thereby
- Patent Title (中): 具有对准子系统的光刻设备，器件制造方法以及由此制造的器件
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Application No.: US10736230Application Date: 2003-12-16
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Publication No.: US07002667B2Publication Date: 2006-02-21
- Inventor: Leon Martin Levasier , Arie Jeffrey Den Boef , Ingo Dirnstorfer , Andre Bernardus Jeunink , Stefan Geerte Kruijswijk , Henricus Petrus Maria Pellemans , Irwan Dani Setija , Hoite Pieter Theodoor Tolsma
- Applicant: Leon Martin Levasier , Arie Jeffrey Den Boef , Ingo Dirnstorfer , Andre Bernardus Jeunink , Stefan Geerte Kruijswijk , Henricus Petrus Maria Pellemans , Irwan Dani Setija , Hoite Pieter Theodoor Tolsma
- Applicant Address: NL Veldhoven
- Assignee: ASML, Netherlands B.V.
- Current Assignee: ASML, Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Priority: EP02080334 20021216; EP03075432 20030214; EP03076010 20030404
- Main IPC: G03B27/72
- IPC: G03B27/72 ; G03B27/42
Abstract:
A lithographic apparatus according to one embodiment of the invention includes an alignment subsystem configured to align the substrate on the substrate table relative to the patterning structure. The alignment structure comprises a non-periodic feature which may be detectable as e.g. a capture position or a check position using a reference grating in the alignment subsystem. The non-periodic feature may cause a phase effect in the detected signal of the alignment subsystem or an amplitude effect.
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