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    Lithographic apparatus and device manufacturing method to determine improved absolute position of exposure fields using mark structures
    2.
    发明授权
    Lithographic apparatus and device manufacturing method to determine improved absolute position of exposure fields using mark structures 有权
    使用标记结构确定改善的曝光场绝对位置的光刻设备和器件制造方法

    公开(公告)号：US08908152B2

    公开(公告)日：2014-12-09

    申请号：US12621143

    申请日：2009-11-18

    申请人： Franciscus Godefridus Casper Bijnen ,  Jozef Cornelis Antonius Roijers ,  Patrick Warnaar ,  Marc Van Kemenade ,  Hoite Pieter Theodoor Tolsma

    发明人： Franciscus Godefridus Casper Bijnen ,  Jozef Cornelis Antonius Roijers ,  Patrick Warnaar ,  Marc Van Kemenade ,  Hoite Pieter Theodoor Tolsma

    IPC分类号： G03B27/32 ,  G03F9/00

    CPC分类号： G03F9/7049 ,  G03F9/7003 ,  G03F9/7076 ,  G03F9/7084

    摘要： A method for manufacturing a device includes providing a substrate, the substrate including a plurality of exposure fields, each exposure field including one or more target portions and at least one mark structure, the mark structure being arranged as positional mark for the exposure field; scanning and measuring the mark of each exposure field to obtain alignment information for the respective exposure field; determining an absolute position of each exposure field from the alignment information for the respective exposure field; determining a relative position of each exposure field with respect to at least one other exposure field by use of additional information on the relative parameters of the exposure field and the at least one other exposure field relative to each other; and combining the absolute positions and the determined relative positions into improved absolute positions for each of the plurality of exposure fields.

    摘要翻译： 一种制造器件的方法包括：提供衬底，所述衬底包括多个曝光场，每个曝光场包括一个或多个目标部分和至少一个标记结构，所述标记结构被布置为所述曝光场的位置标记; 扫描和测量每个曝光场的标记以获得相应曝光场的对准信息; 根据相应曝光场的对准信息确定每个曝光场的绝对位置; 通过使用关于相对于彼此的曝光场和至少一个其他曝光场的相对参数的附加信息来确定每个曝光场相对于至少一个其它曝光场的相对位置; 以及将所述绝对位置和所确定的相对位置组合为所述多个曝光场中的每一个的改进的绝对位置。

    Method and apparatus for vibration detection and vibration analysis, and lithographic apparatus equipped with such an apparatus
    7.
    发明授权
    Method and apparatus for vibration detection and vibration analysis, and lithographic apparatus equipped with such an apparatus 有权
    用于振动检测和振动分析的方法和装置以及配备有这种装置的光刻设备

    公开(公告)号：US07409302B2

    公开(公告)日：2008-08-05

    申请号：US11226468

    申请日：2005-09-15

    申请人： Haico Victor Kok ,  Koen Kivits ,  Ron Van De Laak ,  Johannes Maria Kuiper ,  Gerbrand Van Der Zouw ,  Hoite Pieter Theodoor Tolsma

    发明人： Haico Victor Kok ,  Koen Kivits ,  Ron Van De Laak ,  Johannes Maria Kuiper ,  Gerbrand Van Der Zouw ,  Hoite Pieter Theodoor Tolsma

    IPC分类号： G01L7/00

    CPC分类号： G03F7/70666 ,  G03F7/709 ,  G03F9/7096

    摘要： The invention provides a method for determining vibration-related information by projecting an aerial image at an image position in a projection plane, mapping an intensity of the aerial image into an image map, the image map arranged for comprising values of coordinates of sampling locations and of the intensity sampled at each sampling location, and measuring intensity of the aerial image received through a slot pattern. The method further includes determining from the image map a detection position of a slope portion of the image map, at the detection position of the slope portion, measuring of a temporal intensity of the aerial image and measuring of relative positions of the slot pattern and the image position, the relative positions of the slot being measured as position-related data of the slot pattern and determining from the temporal intensity of the aerial image vibration-related information for said aerial image.

    摘要翻译： 本发明提供了一种用于通过在投影平面中的图像位置处投射空中图像来确定振动相关信息的方法，将空间图像的强度映射到图像映射中，该图像映射被布置为包括采样位置的坐标值， 在每个采样位置采样的强度，以及测量通过槽模式接收的空间图像的强度。 该方法还包括从图像映射确定图像映射的斜率部分的检测位置，在斜率部分的检测位置处，测量空中图像的时间强度，以及测量狭槽图案的相对位置和 图像位置，将被测量的时隙的相对位置作为时隙图案的位置相关数据，并根据所述空间图像的空间图像振动相关信息的时间强度确定。