发明授权
US07005708B2 Minimum-dimension, fully-silicided MOS driver and ESD protection design for optimized inter-finger coupling 有权
最小尺寸,全硅化MOS驱动器和ESD保护设计,实现优化的手指间耦合

Minimum-dimension, fully-silicided MOS driver and ESD protection design for optimized inter-finger coupling
摘要:
An electrostatic discharge (ESD) MOS transistor including a plurality of interleaved fingers, where the MOS transistor is formed in an I/O periphery of and integrated circuit (IC) for providing ESD protection for the IC. The MOS transistor includes a P-substrate and a Pwell disposed over the P-substrate. The plurality of interleaved fingers each include an N+ source region, an N+ drain region, and a gate region formed over a channel region disposed between the source and drain regions. Each source and drain includes a row of contacts that is shared by an adjacent finger, wherein each contact hole in each contact row has a distance to the gate region defined under minimum design rules for core functional elements of the IC. The Pwell forms a common parasitic bipolar junction transistor base for contemporaneously triggering each finger of the MOS transistor during an ESD event.
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