- 专利标题： Illumination system particularly for microlithography
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申请号： US10150650申请日： 2002-05-17
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公开(公告)号： US07006595B2公开(公告)日： 2006-02-28
- 发明人: Wolfgang Singer , Jörg Schultz , Johannes Wangler , Karl-Heinz Schuster , Udo Dinger , Martin Antoni , Joachim Wietzorrek , Joachim Hainz
- 申请人： Wolfgang Singer , Jörg Schultz , Johannes Wangler , Karl-Heinz Schuster , Udo Dinger , Martin Antoni , Joachim Wietzorrek , Joachim Hainz
- 申请人地址： DE Oberkochen
- 专利权人： Carl Zeiss Semiconductor Manufacturing Technologies AG
- 当前专利权人： Carl Zeiss Semiconductor Manufacturing Technologies AG
- 当前专利权人地址： DE Oberkochen
- 代理机构： Ohlandt, Greeley, Ruggiero & Perle LLP.
- 优先权： DE19819898 19980505; DE19903807 19990202; DE29902108 19990208; WOPCT/EP00/07258 20000728
- 主分类号： G21K5/04
- IPC分类号： G21K5/04 ; G21K5/10 ; G03B27/42 ; G03B27/54 ; G03B27/72
摘要：
There is provided an illumination system for scannertype microlithography along a scanning direction with a light source emitting a wavelength ≦193 nm. The illumination system includes a plurality of raster elements. The plurality of raster elements is imaged into an image plane of the illumination system to produce a plurality of images being partially superimposed on a field in the image plane. The field defines a non-rectangular intensity profile in the scanning direction.
公开/授权文献
- US20030086524A1 Illumination system particularly for microlithography 公开/授权日：2003-05-08
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