发明授权
US07008810B2 Method for fabricating at least one mesa or ridge structure or at least one electrically pumped region in a layer or layer sequence
有权
用于在层或层序列中制造至少一个台面或脊结构或至少一个电泵浦区域的方法
- 专利标题: Method for fabricating at least one mesa or ridge structure or at least one electrically pumped region in a layer or layer sequence
- 专利标题(中): 用于在层或层序列中制造至少一个台面或脊结构或至少一个电泵浦区域的方法
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申请号: US10804514申请日: 2004-03-19
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公开(公告)号: US07008810B2公开(公告)日: 2006-03-07
- 发明人: Christine Höss , Andreas Weimar , Andreas Leber , Alfred Lell , Helmut Fischer , Volker Harle
- 申请人: Christine Höss , Andreas Weimar , Andreas Leber , Alfred Lell , Helmut Fischer , Volker Harle
- 申请人地址: DE Regensburg
- 专利权人: Osram Opto Semiconductors GmbH
- 当前专利权人: Osram Opto Semiconductors GmbH
- 当前专利权人地址: DE Regensburg
- 代理机构: Cohen, Pontani, Lieberman & Pavane
- 优先权: DE10312214 20030319
- 主分类号: H01L21/00
- IPC分类号: H01L21/00
摘要:
A method for fabricating at least one mesa or ridge structure in a layer or layer sequence, in which a sacrificial layer (4) is applied and patterned above the layer or layer sequence. A mask layer is applied and patterned above the sacrificial layer for definition of the mesa or ridge dimensions. The sacrificial layer (4) and of the layer or layer sequence are removed so that the mesa or ridge structure is formed in the layer or layer sequence. A part of the sacrificial layer (4) is selectively removed from the side areas thereof which have been uncovered in the previous step, so that a sacrificial layer remains which is narrower in comparison with a layer that has remained above the sacrificial layer as seen from the layer or layer sequence. A coating is applied at least to the sidewalls of the structure produced in the previous steps so that the side areas of the residual sacrificial layer are not completely overformed by the coating material. The sacrificial layer (4) is removed so that the layer that has remained above the sacrificial layer as seen from the layer or layer sequence is lifted off. A method is also disclosed for fabricating at least one gain-controlled laser diode in a layer sequence, in which method steps analogous to those described above are employed.
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