Invention Grant
- Patent Title: Electrically controlled plasma uniformity in a high density plasma source
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Application No.: US10229036Application Date: 2002-08-28
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Publication No.: US07019253B2Publication Date: 2006-03-28
- Inventor: Wayne L. Johnson , Thomas H. Windhorn , Eric J. Strang
- Applicant: Wayne L. Johnson , Thomas H. Windhorn , Eric J. Strang
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: B23K10/00
- IPC: B23K10/00

Abstract:
Apparatus including a chamber and a coil system for converting a field-generating current into a RF magnetic field in the chamber when the chamber contains an ionized gas which interacts with the RF magnetic field to create a plasma. The plasma is contained within a cylindrical region enclosed by the chamber, which region has a longitudinal center axis, and the region is considered to be made up of a plurality of annular zones concentric with the center axis and disposed at respectively different distances from the center axis. The coil system is composed of: a plurality of individual coils each positioned and dimensioned to produce a RF magnetic field which predominantly influences a respective annular zone.
Public/Granted literature
- US20030006019A1 Electrically controlled plasma uniformity in a high density plasma source Public/Granted day:2003-01-09
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