发明授权
- 专利标题: Silicon chip carrier with through-vias using laser assisted chemical vapor deposition of conductor
- 专利标题(中): 采用激光辅助化学气相沉积导体的通孔的硅芯片载体
-
申请号: US10686640申请日: 2003-10-17
-
公开(公告)号: US07019402B2公开(公告)日: 2006-03-28
- 发明人: Paul Stephen Andry , Leena Paivikki Buchwalter , Russell Alan Budd , Thomas Anthony Wassick
- 申请人: Paul Stephen Andry , Leena Paivikki Buchwalter , Russell Alan Budd , Thomas Anthony Wassick
- 申请人地址: US NY Armonk
- 专利权人: International Business Machines Corporation
- 当前专利权人: International Business Machines Corporation
- 当前专利权人地址: US NY Armonk
- 代理机构: Connolly Bove Lodge & Hutz LPP
- 代理商 Daniel P. Morris
- 主分类号: H01L23/48
- IPC分类号: H01L23/48
摘要:
This disclosure teaches a method of filling deep vias or capping deep conducting paste filled vias in silicon or glass substrate using laser assisted chemical vapor deposition of metals. This method uses a continuous wave or pulsed laser to heat the via bottom and the growing metal fill selectively by selecting the laser wavelength such that silicon and/or glass do not absorb the energy of the laser in any appreciable manner to cause deposition in the field. Alternatively holographic mask or an array of micro lenses may be used to focus the laser beams to the vias to fill them with metal. The substrate is moved in a controlled manner in the z-direction away from the laser at about the rate of deposition thus causing the laser heating to be focused on the surface region of the growing metal fill.
公开/授权文献
信息查询
IPC分类: