发明授权
- 专利标题： PVD method and PVD apparatus
- 专利标题（中）： PVD方法和PVD装置
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申请号： US10620570申请日： 2003-07-16
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公开(公告)号： US07022209B2公开(公告)日： 2006-04-04
- 发明人: Winfried Sabisch , Alfred Kersch , Georg Schulze-Icking , Thomas Witke , Ralf Zedlitz
- 申请人： Winfried Sabisch , Alfred Kersch , Georg Schulze-Icking , Thomas Witke , Ralf Zedlitz
- 申请人地址： DE Munich
- 专利权人： Infineon Technologies AG
- 当前专利权人： Infineon Technologies AG
- 当前专利权人地址： DE Munich
- 代理商 Laurence A. Greenberg; Werner H. Stemer; Ralph E. Locher
- 优先权： DE10232179 20020716
- 主分类号： C23C14/35
- IPC分类号： C23C14/35
摘要：
A PVD method and a PVD apparatus use a rotating magnetic field in order to increase the yield. The magnetic field is provided such that it essentially vanishes, at least in a time average, outside a rotation axis of the magnetic field in sectors of the target region of the PVD apparatus. In this manner the PVD method and the PVD apparatus achieve a uniform coating.
公开/授权文献
- US20040011640A1 PVD method and PVD apparatus 公开/授权日：2004-01-22