发明授权
- 专利标题: Radiation converting substrate, radiation image pickup apparatus and radiation image pickup system
- 专利标题(中): 辐射转换基板,放射线摄像装置和放射线摄像系统
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申请号: US10657224申请日: 2003-09-09
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公开(公告)号: US07026624B2公开(公告)日: 2006-04-11
- 发明人: Yoshihiro Ogawa , Kengo Emoto
- 申请人: Yoshihiro Ogawa , Kengo Emoto
- 申请人地址: JP Tokyo
- 专利权人: Canon Kabushiki Kaisha
- 当前专利权人: Canon Kabushiki Kaisha
- 当前专利权人地址: JP Tokyo
- 代理机构: Fitzpatrick, Cella, Harper & Scinto
- 优先权: JP2002-265572 20020911
- 主分类号: G01T1/24
- IPC分类号: G01T1/24
摘要:
The invention is to prevent an interlayer cleavage between a phosphor layer and a moisture-preventing protective layer. In a radiation converting substrate constituted by forming at least a phosphor layer 12 composed of an alkali halide for converting a radiation into light and a light emission activator, and a moisture-preventing protective layer in succession on a radiation-transmitting substrate 11, the moisture-preventing protective layer is constituted of a first plasma polymerization film 13 formed from a monomer of a silane compound, and a second plasma polymerization film 14 formed from a monomer of a fluorine-containing unsaturated hydrocarbon. A radiation image pickup apparatus is formed by adhering such radiation converting substrate and a sensor substrate having a photoelectric converting element.