发明授权
- 专利标题： Photosensitive resin composition, dry film, and workpiece using the same
- 专利标题（中）： 感光树脂组合物，干膜和使用其的工件
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申请号： US10301731申请日： 2002-11-22
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公开(公告)号： US07030170B2公开(公告)日： 2006-04-18
- 发明人: Syuji Tahara , Etsuo Ohkawado , Moritsugu Morita , Kazuhito Fujita , Takeshi Tsuda
- 申请人： Syuji Tahara , Etsuo Ohkawado , Moritsugu Morita , Kazuhito Fujita , Takeshi Tsuda
- 申请人地址： JP Tokyo
- 专利权人： Mitsui Chemicals, Inc.
- 当前专利权人： Mitsui Chemicals, Inc.
- 当前专利权人地址： JP Tokyo
- 代理机构： Buchanan Ingersoll PC
- 优先权： JP2001-357436 20011122; JP2002-128328 20020430
- 主分类号： C08F2/46
- IPC分类号： C08F2/46 ; G03F7/039
摘要：
A photosensitive resin composition which contains (A) polyamic acid, (B) (meth)acrylate having at least two photopolymerizable C═C unsaturated double bonds, (C) a photopolymerization initiator and (D) a flame retardant, with the (meth)acrylate (B) having at least two photopolymerizable C═C unsaturated double bonds being contained in an amount of 10 to 700 parts by weight based on 100 parts by weight of the polyamic acid (A).
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