发明授权
- 专利标题: Substrate material for X-ray optical components
- 专利标题(中): X射线光学部件用基板材料
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申请号: US10779516申请日: 2004-02-13
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公开(公告)号: US07031428B2公开(公告)日: 2006-04-18
- 发明人: Udo Dinger , Frank Eisert , Martin Weiser , Konrad Knapp , Ina Mitra , Hans Morian
- 申请人: Udo Dinger , Frank Eisert , Martin Weiser , Konrad Knapp , Ina Mitra , Hans Morian
- 申请人地址: DE Oberkochen DE Mainz
- 专利权人: Carl-Zeiss SMT AG,Schott AG
- 当前专利权人: Carl-Zeiss SMT AG,Schott AG
- 当前专利权人地址: DE Oberkochen DE Mainz
- 代理机构: Ohlandt, Greeley, Ruggiero, & Perle LLP.
- 优先权: DE10139188 20010816
- 主分类号: G21K5/04
- IPC分类号: G21K5/04 ; G21K1/06 ; C03C10/00
摘要:
There is provided a substrate material for an optical component for X-rays of wavelength λR. The substrate includes (a) a glass phase made of amorphous material having a positive coefficient of thermal expansion, and (b) a crystal phase including microcrystallites having a negative coefficient of thermal expansion and a mean size of less than about 4 λR. The substrate material has a stoichiometric ratio of the crystal phase to the glass phase such that a coefficient of thermal expansion of the substrate material is less than about 5×10−6 K−1 in a temperature range of about 20 °C. to 100°C. The substrate material, following a surface treatment, has a high spatial frequency roughness (HSFR) of less than about λR/30 rms.
公开/授权文献
- US20040202278A1 Substrate material for X-ray optical components 公开/授权日:2004-10-14
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