Invention Grant
- Patent Title: Substrate material for X-ray optical components
- Patent Title (中): X射线光学部件用基板材料
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Application No.: US10779516Application Date: 2004-02-13
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Publication No.: US07031428B2Publication Date: 2006-04-18
- Inventor: Udo Dinger , Frank Eisert , Martin Weiser , Konrad Knapp , Ina Mitra , Hans Morian
- Applicant: Udo Dinger , Frank Eisert , Martin Weiser , Konrad Knapp , Ina Mitra , Hans Morian
- Applicant Address: DE Oberkochen DE Mainz
- Assignee: Carl-Zeiss SMT AG,Schott AG
- Current Assignee: Carl-Zeiss SMT AG,Schott AG
- Current Assignee Address: DE Oberkochen DE Mainz
- Agency: Ohlandt, Greeley, Ruggiero, & Perle LLP.
- Priority: DE10139188 20010816
- Main IPC: G21K5/04
- IPC: G21K5/04 ; G21K1/06 ; C03C10/00

Abstract:
There is provided a substrate material for an optical component for X-rays of wavelength λR. The substrate includes (a) a glass phase made of amorphous material having a positive coefficient of thermal expansion, and (b) a crystal phase including microcrystallites having a negative coefficient of thermal expansion and a mean size of less than about 4 λR. The substrate material has a stoichiometric ratio of the crystal phase to the glass phase such that a coefficient of thermal expansion of the substrate material is less than about 5×10−6 K−1 in a temperature range of about 20 °C. to 100°C. The substrate material, following a surface treatment, has a high spatial frequency roughness (HSFR) of less than about λR/30 rms.
Public/Granted literature
- US20040202278A1 Substrate material for X-ray optical components Public/Granted day:2004-10-14
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