Invention Grant
- Patent Title: Electron beam irradiation apparatus, electron beam irradiation method, original disk, stamper, and recording medium
- Patent Title (中): 电子束照射装置,电子束照射方法,原盘,压模和记录介质
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Application No.: US09789943Application Date: 2001-02-28
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Publication No.: US07034319B2Publication Date: 2006-04-25
- Inventor: Yuichi Aki , Takao Kondo , Minoru Takeda , Masanobu Yamamoto , Shin Masuhara , Toshiyuki Kashiwagi
- Applicant: Yuichi Aki , Takao Kondo , Minoru Takeda , Masanobu Yamamoto , Shin Masuhara , Toshiyuki Kashiwagi
- Applicant Address: JP Tokyo
- Assignee: Sony Corporation
- Current Assignee: Sony Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sonnenschein Nath & Rosenthal LLP
- Priority: JPP2000-057374 20000302
- Main IPC: C23F1/00
- IPC: C23F1/00

Abstract:
An electron beam irradiation apparatus, includes a support section for supporting an electron beam irradiation subject to be irradiated with an electron beam, and an electron beam irradiation head opposed to the electron beam irradiation subject via a minute space, the electron beam irradiation head having an electron beam emission hole for irradiating the electron beam irradiation subject with the electron beam. In the electron beam irradiation head, an electron beam path communicating with the electron beam emission hole is provided, and in addition one or more ring shaped gas suction grooves opened from a surface of the electron beam irradiation head facing the electron beam irradiation subject is formed around the electron beam emission hole. Vacuum pumps are coupled to the electron beam path and the ring shaped gas suction grooves, and the electron beam path is held in a high vacuum state.
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