发明授权
US07034329B2 Semiconductor device including band-engineered superlattice having 3/1-5/1 germanium layer structure 有权
包括具有3 / 1-5 / 1锗层结构的带状工程超晶格的半导体器件

Semiconductor device including band-engineered superlattice having 3/1-5/1 germanium layer structure
摘要:
A semiconductor device includes a superlattice that, in turn, includes a plurality of stacked groups of layers. The device may also include regions for causing transport of charge carriers through the superlattice in a parallel direction relative to the stacked groups of layers. Each group of the superlattice may include a plurality of stacked base semiconductor monolayers defining a base semiconductor portion and an energy band-modifying layer thereon. Moreover, the energy-band modifying layer may include at least one non-semiconductor monolayer constrained within a crystal lattice of adjacent base semiconductor portions. Accordingly, the superlattice may have a higher charge carrier mobility in the parallel direction than would otherwise be present.
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