Invention Grant
US07037438B2 Method for production of a semiconductor component and a semiconductor component produced by said method
有权
用于制造通过所述方法制造的半导体部件和半导体部件的方法
- Patent Title: Method for production of a semiconductor component and a semiconductor component produced by said method
- Patent Title (中): 用于制造通过所述方法制造的半导体部件和半导体部件的方法
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Application No.: US10070286Application Date: 2001-04-20
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Publication No.: US07037438B2Publication Date: 2006-05-02
- Inventor: Hubert Benzel , Heribert Weber , Hans Artmann , Frank Schaefer
- Applicant: Hubert Benzel , Heribert Weber , Hans Artmann , Frank Schaefer
- Applicant Address: DE Stuttgart
- Assignee: Robert Bosch GmbH
- Current Assignee: Robert Bosch GmbH
- Current Assignee Address: DE Stuttgart
- Agency: Kenyon & Kenyon
- Priority: DE10032579 20000705
- International Application: PCT/DE01/01516 WO 20010420
- International Announcement: WO02/02458 WO 20020110
- Main IPC: H01L21/302
- IPC: H01L21/302

Abstract:
A method is for producing a semiconductor component, e.g., a multilayer semiconductor element, e.g., a micromechanical component, e.g., a pressure sensor, having a semiconductor substrate, e.g., made of silicon, and a semiconductor component produced according to the method. To reduce the production cost of such a semiconductor component, in a first step a first porous layer is produced in the semiconductor component, and in a second step a hollow or cavity is produced under or from the first porous layer in the semiconductor component, with the hollow or cavity capable of being provided with an external access opening.
Public/Granted literature
- US20020170875A1 Method for production of a semiconductor component and a semiconductor component produced by said method Public/Granted day:2002-11-21
Information query
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