- 专利标题: Apparatus and method for testing defects
-
申请号: US10170378申请日: 2002-06-14
-
公开(公告)号: US07037735B2公开(公告)日: 2006-05-02
- 发明人: Minori Noguchi , Yoshimasa Ohshima , Hidetoshi Nishiyama , Shunichi Matsumoto , Yukio Kembo , Ryouji Matsunaga , Keiji Sakai , Takanori Ninomiya , Tetsuya Watanabe , Hisato Nakamura , Takahiro Jingu , Yoshio Morishige , Shuichi Chikamatsu
- 申请人: Minori Noguchi , Yoshimasa Ohshima , Hidetoshi Nishiyama , Shunichi Matsumoto , Yukio Kembo , Ryouji Matsunaga , Keiji Sakai , Takanori Ninomiya , Tetsuya Watanabe , Hisato Nakamura , Takahiro Jingu , Yoshio Morishige , Shuichi Chikamatsu
- 申请人地址: JP Tokyo JP Tokyo
- 专利权人: Hitachi, Ltd.,Hitachi High-Technologies Corporation
- 当前专利权人: Hitachi, Ltd.,Hitachi High-Technologies Corporation
- 当前专利权人地址: JP Tokyo JP Tokyo
- 代理机构: Antonelli, Terry, Stout and Kraus, LLP.
- 优先权: JPP10-213056 19980728
- 主分类号: H01L21/66
- IPC分类号: H01L21/66 ; G01R31/26
摘要:
A defect inspection method includes radiating an illumination slit-shaped beam having lights substantially parallel to a longitudinal direction to a substrate having circuit patterns in a direction inclined at a predetermined gradient relative to the direction of a line normal to the substrate and inclined at a predetermined gradient on a surface with respect to a group of main straight lines of the circuit patterns with its longitudinal direction oriented almost perpendicularly to a direction of a movement of the substrate. Scattered light reflected by a defect such as a foreign particle existing on the illuminated substrate is received and converted into a detection signal by using an image sensor, and defect judging is effected of an extracted a signal indicating a defect such as a foreign particle on the basis of the detection signal output.
公开/授权文献
- US20020168787A1 Apparatus and method for testing defects 公开/授权日:2002-11-14
信息查询
IPC分类: